Tensor evaluation of anisotropic stress relaxation in mesa-shaped sige layer on si substrate by electron back-scattering pattern measurement: Comparison between raman measurement and finite element method simulation

Motohiro Tomita, Masaya Nagasaka, Daisuke Kosemura, Koji Usuda, Tsutomu Tezuka, Atsushi Ogura

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3 Citations (Scopus)

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Engineering & Materials Science

Physics & Astronomy