Tensor evaluation of anisotropic stress relaxation in mesa-shaped sige layer on si substrate by electron back-scattering pattern measurement: Comparison between raman measurement and finite element method simulation

Motohiro Tomita*, Masaya Nagasaka, Daisuke Kosemura, Koji Usuda, Tsutomu Tezuka, Atsushi Ogura

*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

3 Citations (Scopus)

Fingerprint

Dive into the research topics of 'Tensor evaluation of anisotropic stress relaxation in mesa-shaped sige layer on si substrate by electron back-scattering pattern measurement: Comparison between raman measurement and finite element method simulation'. Together they form a unique fingerprint.

Engineering & Materials Science

Physics & Astronomy