The Chemical Vapor Deposition of Polycrystalline InP

Masahide Inuishi, Bruce W. Wessels

Research output: Contribution to journalArticle

7 Citations (Scopus)
Original languageEnglish
Pages (from-to)2747-2750
Number of pages4
JournalJournal of the Electrochemical Society
Volume127
Issue number12
DOIs
Publication statusPublished - 1980
Externally publishedYes

Fingerprint

Chemical vapor deposition
vapor deposition
Thin films
thin films

Keywords

  • polycrystalline semiconductors
  • thin films

ASJC Scopus subject areas

  • Electrochemistry
  • Condensed Matter Physics
  • Electronic, Optical and Magnetic Materials
  • Materials Chemistry
  • Renewable Energy, Sustainability and the Environment
  • Surfaces, Coatings and Films

Cite this

The Chemical Vapor Deposition of Polycrystalline InP. / Inuishi, Masahide; Wessels, Bruce W.

In: Journal of the Electrochemical Society, Vol. 127, No. 12, 1980, p. 2747-2750.

Research output: Contribution to journalArticle

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