The effects of UV irradiation on titania deposition from titanium tetra-isopropoxide

Yasuyuki Egashira; Masato Sugimachi; Kouichi Nishizawa; Kazunobu Saito; Toshio Ohsawa; Hiroshi Komiyama

doi:10.1016/0169-4332(94)90442-1

The effects of UV irradiation on titania deposition from titanium tetra-isopropoxide

Yasuyuki Egashira^*, Masato Sugimachi, Kouichi Nishizawa, Kazunobu Saito, Toshio Ohsawa, Hiroshi Komiyama

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

4 Citations (Scopus)

Abstract

The influence of UV irradiation on the deposition of titania from titanium tetra-isopropoxide (TTIP) under reduced pressure was studied. It was found that UV irradiation accelerates the titania growth rate by a factor of 2-3 in the temperature range of 573 to 623 K. The coverage quality of micron-size trenches in the cases with and without UV irradiation indicates the role of the photo-enhanced surface reaction. The threshold wavelength of 380 nm which is equivalent to the energy gap of anatase indicates strongly that band-to-band excitation is responsible for the photo-enhanced surface reaction.

Original language	English
Pages (from-to)	389-392
Number of pages	4
Journal	Applied Surface Science
Volume	79-80
Issue number	C
DOIs	https://doi.org/10.1016/0169-4332(94)90442-1
Publication status	Published - 1994 May 2
Externally published	Yes

ASJC Scopus subject areas

Surfaces, Coatings and Films

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10.1016/0169-4332(94)90442-1

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abstract = "The influence of UV irradiation on the deposition of titania from titanium tetra-isopropoxide (TTIP) under reduced pressure was studied. It was found that UV irradiation accelerates the titania growth rate by a factor of 2-3 in the temperature range of 573 to 623 K. The coverage quality of micron-size trenches in the cases with and without UV irradiation indicates the role of the photo-enhanced surface reaction. The threshold wavelength of 380 nm which is equivalent to the energy gap of anatase indicates strongly that band-to-band excitation is responsible for the photo-enhanced surface reaction.",

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T1 - The effects of UV irradiation on titania deposition from titanium tetra-isopropoxide

AU - Egashira, Yasuyuki

AU - Sugimachi, Masato

AU - Nishizawa, Kouichi

AU - Saito, Kazunobu

AU - Ohsawa, Toshio

AU - Komiyama, Hiroshi

PY - 1994/5/2

Y1 - 1994/5/2

N2 - The influence of UV irradiation on the deposition of titania from titanium tetra-isopropoxide (TTIP) under reduced pressure was studied. It was found that UV irradiation accelerates the titania growth rate by a factor of 2-3 in the temperature range of 573 to 623 K. The coverage quality of micron-size trenches in the cases with and without UV irradiation indicates the role of the photo-enhanced surface reaction. The threshold wavelength of 380 nm which is equivalent to the energy gap of anatase indicates strongly that band-to-band excitation is responsible for the photo-enhanced surface reaction.

AB - The influence of UV irradiation on the deposition of titania from titanium tetra-isopropoxide (TTIP) under reduced pressure was studied. It was found that UV irradiation accelerates the titania growth rate by a factor of 2-3 in the temperature range of 573 to 623 K. The coverage quality of micron-size trenches in the cases with and without UV irradiation indicates the role of the photo-enhanced surface reaction. The threshold wavelength of 380 nm which is equivalent to the energy gap of anatase indicates strongly that band-to-band excitation is responsible for the photo-enhanced surface reaction.

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JO - Applied Surface Science

JF - Applied Surface Science

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The effects of UV irradiation on titania deposition from titanium tetra-isopropoxide

Abstract

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