The effects of UV irradiation on titania deposition from titanium tetra-isopropoxide

Yasuyuki Egashira*, Masato Sugimachi, Kouichi Nishizawa, Kazunobu Saito, Toshio Ohsawa, Hiroshi Komiyama

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

4 Citations (Scopus)


The influence of UV irradiation on the deposition of titania from titanium tetra-isopropoxide (TTIP) under reduced pressure was studied. It was found that UV irradiation accelerates the titania growth rate by a factor of 2-3 in the temperature range of 573 to 623 K. The coverage quality of micron-size trenches in the cases with and without UV irradiation indicates the role of the photo-enhanced surface reaction. The threshold wavelength of 380 nm which is equivalent to the energy gap of anatase indicates strongly that band-to-band excitation is responsible for the photo-enhanced surface reaction.

Original languageEnglish
Pages (from-to)389-392
Number of pages4
JournalApplied Surface Science
Issue numberC
Publication statusPublished - 1994 May 2
Externally publishedYes

ASJC Scopus subject areas

  • Surfaces, Coatings and Films


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