The Influence of Negative Ions Generation on the Arc-Melted and Hot Press Sintered Scal Alloy Targets to the Crystalline Orientation and kt 2 of the Scaln Films

Yuka Endo, Rei Karasawa, Shinji Takayanagi, Makoto Imakawa, Keisuke Morisaka, Yu Suzuki, Takahiko Yanagitani

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    1 Citation (Scopus)

    Abstract

    Film Bulk Acoustic Resonator (FBAR) will become commonplace for the frequency filter used in mobile communication. AIN films were used for piezoelectric material of FBAR. High piezoelectricity of ScAlN films have attracted much attention as FBAR material. However, negative ion generation at Sc metal target induces degradation of the crystallinity due to the ion bombardment on ScAlN films during the sputtering growth. Large amount of O- and CN-ions generation at sputtering target were observed. In this study, we compared the energy distributions of negative ions of arc-melted and sintered ScAl alloy targets which have different oxygen and carbon concentration. The c-axis orientation and electromechanical coupling coefficient kt2of ScAlN films fabricated with these different targets were also compared. As a result, the kt2of two targets was larger than our previous report. There were the large differences in amount of O- and CN- ions generation in the two targets. However, it does not significantly affect the results of the crystallization and kt2of the ScAlN films.

    Original languageEnglish
    Title of host publication2018 IEEE International Ultrasonics Symposium, IUS 2018
    PublisherIEEE Computer Society
    Volume2018-October
    ISBN (Electronic)9781538634257
    DOIs
    Publication statusPublished - 2018 Dec 17
    Event2018 IEEE International Ultrasonics Symposium, IUS 2018 - Kobe, Japan
    Duration: 2018 Oct 222018 Oct 25

    Other

    Other2018 IEEE International Ultrasonics Symposium, IUS 2018
    CountryJapan
    CityKobe
    Period18/10/2218/10/25

    Keywords

    • electro mechanical coefficient
    • negative ion bombardment
    • piezoelectric film
    • ScAlN

    ASJC Scopus subject areas

    • Acoustics and Ultrasonics

    Fingerprint Dive into the research topics of 'The Influence of Negative Ions Generation on the Arc-Melted and Hot Press Sintered Scal Alloy Targets to the Crystalline Orientation and k<sub>t</sub> <sup>2</sup> of the Scaln Films'. Together they form a unique fingerprint.

  • Cite this

    Endo, Y., Karasawa, R., Takayanagi, S., Imakawa, M., Morisaka, K., Suzuki, Y., & Yanagitani, T. (2018). The Influence of Negative Ions Generation on the Arc-Melted and Hot Press Sintered Scal Alloy Targets to the Crystalline Orientation and kt 2 of the Scaln Films. In 2018 IEEE International Ultrasonics Symposium, IUS 2018 (Vol. 2018-October). [8579841] IEEE Computer Society. https://doi.org/10.1109/ULTSYM.2018.8579841