TY - GEN
T1 - The Influence of Negative Ions Generation on the Arc-Melted and Hot Press Sintered Scal Alloy Targets to the Crystalline Orientation and k t 2 of the Scaln Films
AU - Endo, Yuka
AU - Karasawa, Rei
AU - Takayanagi, Shinji
AU - Imakawa, Makoto
AU - Morisaka, Keisuke
AU - Suzuki, Yu
AU - Yanagitani, Takahiko
N1 - Publisher Copyright:
© 2018 IEEE.
PY - 2018/12/17
Y1 - 2018/12/17
N2 - Film Bulk Acoustic Resonator (FBAR) will become commonplace for the frequency filter used in mobile communication. AIN films were used for piezoelectric material of FBAR. High piezoelectricity of ScAlN films have attracted much attention as FBAR material. However, negative ion generation at Sc metal target induces degradation of the crystallinity due to the ion bombardment on ScAlN films during the sputtering growth. Large amount of O - and CN-ions generation at sputtering target were observed. In this study, we compared the energy distributions of negative ions of arc-melted and sintered ScAl alloy targets which have different oxygen and carbon concentration. The c-axis orientation and electromechanical coupling coefficient kt 2 of ScAlN films fabricated with these different targets were also compared. As a result, the kt 2 of two targets was larger than our previous report. There were the large differences in amount of O - and CN- ions generation in the two targets. However, it does not significantly affect the results of the crystallization and kt 2 of the ScAlN films.
AB - Film Bulk Acoustic Resonator (FBAR) will become commonplace for the frequency filter used in mobile communication. AIN films were used for piezoelectric material of FBAR. High piezoelectricity of ScAlN films have attracted much attention as FBAR material. However, negative ion generation at Sc metal target induces degradation of the crystallinity due to the ion bombardment on ScAlN films during the sputtering growth. Large amount of O - and CN-ions generation at sputtering target were observed. In this study, we compared the energy distributions of negative ions of arc-melted and sintered ScAl alloy targets which have different oxygen and carbon concentration. The c-axis orientation and electromechanical coupling coefficient kt 2 of ScAlN films fabricated with these different targets were also compared. As a result, the kt 2 of two targets was larger than our previous report. There were the large differences in amount of O - and CN- ions generation in the two targets. However, it does not significantly affect the results of the crystallization and kt 2 of the ScAlN films.
KW - ScAlN
KW - electro mechanical coefficient
KW - negative ion bombardment
KW - piezoelectric film
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U2 - 10.1109/ULTSYM.2018.8579841
DO - 10.1109/ULTSYM.2018.8579841
M3 - Conference contribution
AN - SCOPUS:85060609017
T3 - IEEE International Ultrasonics Symposium, IUS
BT - 2018 IEEE International Ultrasonics Symposium, IUS 2018
PB - IEEE Computer Society
T2 - 2018 IEEE International Ultrasonics Symposium, IUS 2018
Y2 - 22 October 2018 through 25 October 2018
ER -