The Influence of Negative Ions Generation on the Arc-Melted and Hot Press Sintered Scal Alloy Targets to the Crystalline Orientation and kt 2 of the Scaln Films

Yuka Endo; Rei Karasawa; Shinji Takayanagi; Makoto Imakawa; Keisuke Morisaka; Yu Suzuki; Takahiko Yanagitani

doi:10.1109/ULTSYM.2018.8579841

The Influence of Negative Ions Generation on the Arc-Melted and Hot Press Sintered Scal Alloy Targets to the Crystalline Orientation and k_t ² of the Scaln Films

Yuka Endo, Rei Karasawa, Shinji Takayanagi, Makoto Imakawa, Keisuke Morisaka, Yu Suzuki, Takahiko Yanagitani

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

1 Citation (Scopus)

Abstract

Film Bulk Acoustic Resonator (FBAR) will become commonplace for the frequency filter used in mobile communication. AIN films were used for piezoelectric material of FBAR. High piezoelectricity of ScAlN films have attracted much attention as FBAR material. However, negative ion generation at Sc metal target induces degradation of the crystallinity due to the ion bombardment on ScAlN films during the sputtering growth. Large amount of O^- and CN-ions generation at sputtering target were observed. In this study, we compared the energy distributions of negative ions of arc-melted and sintered ScAl alloy targets which have different oxygen and carbon concentration. The c-axis orientation and electromechanical coupling coefficient kt²of ScAlN films fabricated with these different targets were also compared. As a result, the kt²of two targets was larger than our previous report. There were the large differences in amount of O^- and CN- ions generation in the two targets. However, it does not significantly affect the results of the crystallization and kt²of the ScAlN films.

Original language	English
Title of host publication	2018 IEEE International Ultrasonics Symposium, IUS 2018
Publisher	IEEE Computer Society
Volume	2018-October
ISBN (Electronic)	9781538634257
DOIs	https://doi.org/10.1109/ULTSYM.2018.8579841
Publication status	Published - 2018 Dec 17
Event	2018 IEEE International Ultrasonics Symposium, IUS 2018 - Kobe, Japan Duration: 2018 Oct 22 → 2018 Oct 25

Other

Other	2018 IEEE International Ultrasonics Symposium, IUS 2018
Country/Territory	Japan
City	Kobe
Period	18/10/22 → 18/10/25

Keywords

electro mechanical coefficient
negative ion bombardment
piezoelectric film
ScAlN

ASJC Scopus subject areas

Acoustics and Ultrasonics

Access to Document

10.1109/ULTSYM.2018.8579841

Cite this

Endo, Y., Karasawa, R., Takayanagi, S., Imakawa, M., Morisaka, K., Suzuki, Y., & Yanagitani, T. (2018). The Influence of Negative Ions Generation on the Arc-Melted and Hot Press Sintered Scal Alloy Targets to the Crystalline Orientation and k_t ² of the Scaln Films. In 2018 IEEE International Ultrasonics Symposium, IUS 2018 (Vol. 2018-October). [8579841] IEEE Computer Society. https://doi.org/10.1109/ULTSYM.2018.8579841

The Influence of Negative Ions Generation on the Arc-Melted and Hot Press Sintered Scal Alloy Targets to the Crystalline Orientation and k_t ² of the Scaln Films. / Endo, Yuka; Karasawa, Rei; Takayanagi, Shinji; Imakawa, Makoto; Morisaka, Keisuke; Suzuki, Yu; Yanagitani, Takahiko.

2018 IEEE International Ultrasonics Symposium, IUS 2018. Vol. 2018-October IEEE Computer Society, 2018. 8579841.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Endo, Y, Karasawa, R, Takayanagi, S, Imakawa, M, Morisaka, K, Suzuki, Y & Yanagitani, T 2018, The Influence of Negative Ions Generation on the Arc-Melted and Hot Press Sintered Scal Alloy Targets to the Crystalline Orientation and k_t ² of the Scaln Films. in 2018 IEEE International Ultrasonics Symposium, IUS 2018. vol. 2018-October, 8579841, IEEE Computer Society, 2018 IEEE International Ultrasonics Symposium, IUS 2018, Kobe, Japan, 18/10/22. https://doi.org/10.1109/ULTSYM.2018.8579841

Endo Y, Karasawa R, Takayanagi S, Imakawa M, Morisaka K, Suzuki Y et al. The Influence of Negative Ions Generation on the Arc-Melted and Hot Press Sintered Scal Alloy Targets to the Crystalline Orientation and k_t ² of the Scaln Films. In 2018 IEEE International Ultrasonics Symposium, IUS 2018. Vol. 2018-October. IEEE Computer Society. 2018. 8579841 https://doi.org/10.1109/ULTSYM.2018.8579841

Endo, Yuka ; Karasawa, Rei ; Takayanagi, Shinji ; Imakawa, Makoto ; Morisaka, Keisuke ; Suzuki, Yu ; Yanagitani, Takahiko. / The Influence of Negative Ions Generation on the Arc-Melted and Hot Press Sintered Scal Alloy Targets to the Crystalline Orientation and k_t ² of the Scaln Films. 2018 IEEE International Ultrasonics Symposium, IUS 2018. Vol. 2018-October IEEE Computer Society, 2018.

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abstract = "Film Bulk Acoustic Resonator (FBAR) will become commonplace for the frequency filter used in mobile communication. AIN films were used for piezoelectric material of FBAR. High piezoelectricity of ScAlN films have attracted much attention as FBAR material. However, negative ion generation at Sc metal target induces degradation of the crystallinity due to the ion bombardment on ScAlN films during the sputtering growth. Large amount of O- and CN-ions generation at sputtering target were observed. In this study, we compared the energy distributions of negative ions of arc-melted and sintered ScAl alloy targets which have different oxygen and carbon concentration. The c-axis orientation and electromechanical coupling coefficient kt2of ScAlN films fabricated with these different targets were also compared. As a result, the kt2of two targets was larger than our previous report. There were the large differences in amount of O- and CN- ions generation in the two targets. However, it does not significantly affect the results of the crystallization and kt2of the ScAlN films.",

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