The Influence of Negative Ions Generation on the Arc-Melted and Hot Press Sintered Scal Alloy Targets to the Crystalline Orientation and kt 2 of the Scaln Films

Yuka Endo, Rei Karasawa, Shinji Takayanagi, Makoto Imakawa, Keisuke Morisaka, Yu Suzuki, Takahiko Yanagitani

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    Abstract

    Film Bulk Acoustic Resonator (FBAR) will become commonplace for the frequency filter used in mobile communication. AIN films were used for piezoelectric material of FBAR. High piezoelectricity of ScAlN films have attracted much attention as FBAR material. However, negative ion generation at Sc metal target induces degradation of the crystallinity due to the ion bombardment on ScAlN films during the sputtering growth. Large amount of O- and CN-ions generation at sputtering target were observed. In this study, we compared the energy distributions of negative ions of arc-melted and sintered ScAl alloy targets which have different oxygen and carbon concentration. The c-axis orientation and electromechanical coupling coefficient kt2of ScAlN films fabricated with these different targets were also compared. As a result, the kt2of two targets was larger than our previous report. There were the large differences in amount of O- and CN- ions generation in the two targets. However, it does not significantly affect the results of the crystallization and kt2of the ScAlN films.

    Original languageEnglish
    Title of host publication2018 IEEE International Ultrasonics Symposium, IUS 2018
    PublisherIEEE Computer Society
    Volume2018-October
    ISBN (Electronic)9781538634257
    DOIs
    Publication statusPublished - 2018 Dec 17
    Event2018 IEEE International Ultrasonics Symposium, IUS 2018 - Kobe, Japan
    Duration: 2018 Oct 222018 Oct 25

    Other

    Other2018 IEEE International Ultrasonics Symposium, IUS 2018
    CountryJapan
    CityKobe
    Period18/10/2218/10/25

    Fingerprint

    negative ions
    arcs
    resonators
    acoustics
    sputtering
    ions
    piezoelectricity
    coupling coefficients
    bombardment
    crystallinity
    energy distribution
    communication
    crystallization
    degradation
    filters
    carbon
    oxygen
    metals

    Keywords

    • electro mechanical coefficient
    • negative ion bombardment
    • piezoelectric film
    • ScAlN

    ASJC Scopus subject areas

    • Acoustics and Ultrasonics

    Cite this

    Endo, Y., Karasawa, R., Takayanagi, S., Imakawa, M., Morisaka, K., Suzuki, Y., & Yanagitani, T. (2018). The Influence of Negative Ions Generation on the Arc-Melted and Hot Press Sintered Scal Alloy Targets to the Crystalline Orientation and kt 2 of the Scaln Films. In 2018 IEEE International Ultrasonics Symposium, IUS 2018 (Vol. 2018-October). [8579841] IEEE Computer Society. https://doi.org/10.1109/ULTSYM.2018.8579841

    The Influence of Negative Ions Generation on the Arc-Melted and Hot Press Sintered Scal Alloy Targets to the Crystalline Orientation and kt 2 of the Scaln Films. / Endo, Yuka; Karasawa, Rei; Takayanagi, Shinji; Imakawa, Makoto; Morisaka, Keisuke; Suzuki, Yu; Yanagitani, Takahiko.

    2018 IEEE International Ultrasonics Symposium, IUS 2018. Vol. 2018-October IEEE Computer Society, 2018. 8579841.

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    Endo, Y, Karasawa, R, Takayanagi, S, Imakawa, M, Morisaka, K, Suzuki, Y & Yanagitani, T 2018, The Influence of Negative Ions Generation on the Arc-Melted and Hot Press Sintered Scal Alloy Targets to the Crystalline Orientation and kt 2 of the Scaln Films. in 2018 IEEE International Ultrasonics Symposium, IUS 2018. vol. 2018-October, 8579841, IEEE Computer Society, 2018 IEEE International Ultrasonics Symposium, IUS 2018, Kobe, Japan, 18/10/22. https://doi.org/10.1109/ULTSYM.2018.8579841
    Endo Y, Karasawa R, Takayanagi S, Imakawa M, Morisaka K, Suzuki Y et al. The Influence of Negative Ions Generation on the Arc-Melted and Hot Press Sintered Scal Alloy Targets to the Crystalline Orientation and kt 2 of the Scaln Films. In 2018 IEEE International Ultrasonics Symposium, IUS 2018. Vol. 2018-October. IEEE Computer Society. 2018. 8579841 https://doi.org/10.1109/ULTSYM.2018.8579841
    Endo, Yuka ; Karasawa, Rei ; Takayanagi, Shinji ; Imakawa, Makoto ; Morisaka, Keisuke ; Suzuki, Yu ; Yanagitani, Takahiko. / The Influence of Negative Ions Generation on the Arc-Melted and Hot Press Sintered Scal Alloy Targets to the Crystalline Orientation and kt 2 of the Scaln Films. 2018 IEEE International Ultrasonics Symposium, IUS 2018. Vol. 2018-October IEEE Computer Society, 2018.
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    abstract = "Film Bulk Acoustic Resonator (FBAR) will become commonplace for the frequency filter used in mobile communication. AIN films were used for piezoelectric material of FBAR. High piezoelectricity of ScAlN films have attracted much attention as FBAR material. However, negative ion generation at Sc metal target induces degradation of the crystallinity due to the ion bombardment on ScAlN films during the sputtering growth. Large amount of O- and CN-ions generation at sputtering target were observed. In this study, we compared the energy distributions of negative ions of arc-melted and sintered ScAl alloy targets which have different oxygen and carbon concentration. The c-axis orientation and electromechanical coupling coefficient kt2of ScAlN films fabricated with these different targets were also compared. As a result, the kt2of two targets was larger than our previous report. There were the large differences in amount of O- and CN- ions generation in the two targets. However, it does not significantly affect the results of the crystallization and kt2of the ScAlN films.",
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    AU - Morisaka, Keisuke

    AU - Suzuki, Yu

    AU - Yanagitani, Takahiko

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