The level set method for etching and deposition

D. Adalsteinsson, L. C. Evans, H. Ishii

Research output: Contribution to journalArticle

3 Citations (Scopus)


We provide a rigorous interpretation of the level set approach to certain nonlocal geometric motions modelling etching effects in manufacture. The shadowing of certain parts of a surface by other parts gives rise to a nonlocal Hamilton-Jacobi type PDE, with a multivalued Hamiltonian. We also show that deposition effects do not fall within the conventional level set framework, and accordingly must be reinterpreted for numerical implementation.

Original languageEnglish
Pages (from-to)1153-1186
Number of pages34
JournalMathematical Models and Methods in Applied Sciences
Issue number8
Publication statusPublished - 1997 Dec
Externally publishedYes

ASJC Scopus subject areas

  • Mathematics(all)
  • Applied Mathematics
  • Modelling and Simulation

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    Adalsteinsson, D., Evans, L. C., & Ishii, H. (1997). The level set method for etching and deposition. Mathematical Models and Methods in Applied Sciences, 7(8), 1153-1186.