Abstract
Diamond films have been obtained using magneto-microwave plasma assisted CVD at 0.1 Torr. The reaction gas is a CO/H2 mixture. By setting the ECR condition at the deposition area, a high density plasma (1×1011 cm-3) is obtained around the substrate. The discharge area is quite uniform in the pressure. Diamond films are obtained on positively biased substrates. As the reaction pressure becomes lower, the substrate temperature for the diamond formation tends to decrease. The films were evaluated by SEM imaging, electron diffraction and Raman spectroscopy.
Original language | English |
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Pages (from-to) | L281-L283 |
Journal | Japanese journal of applied physics |
Volume | 28 |
Issue number | 2 A |
DOIs | |
Publication status | Published - 1989 Feb |
Externally published | Yes |
Keywords
- CVD
- Crystal growth
- Diamond film
- ECR
- Microwave plasma
ASJC Scopus subject areas
- Engineering(all)
- Physics and Astronomy(all)