The synthesis of diamond films at lower pressure and lower temperature using magneto-microwave plasma CVD

Jun Ichi Suzuki, Hiroshi Kawarada, King Sheng Mar, Jin Wei, Yoshihiro Yokota, Akio Hiraki

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Abstract

Diamond films have been obtained using magneto-microwave plasma assisted CVD at 0.1 Torr. The reaction gas is a CO/H2 mixture. By setting the ECR condition at the deposition area, a high density plasma (1×1011 cm-3) is obtained around the substrate. The discharge area is quite uniform in the pressure. Diamond films are obtained on positively biased substrates. As the reaction pressure becomes lower, the substrate temperature for the diamond formation tends to decrease. The films were evaluated by SEM imaging, electron diffraction and Raman spectroscopy.

Original languageEnglish
Pages (from-to)L281-L283
JournalJapanese journal of applied physics
Volume28
Issue number2 A
DOIs
Publication statusPublished - 1989 Feb

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Keywords

  • CVD
  • Crystal growth
  • Diamond film
  • ECR
  • Microwave plasma

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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