Thermal annealing behavior of defects induced by ion implantation in thermally grown SiO2 films

Kwang Soo Seol, Toshifumi Karasawa, Yoshimichi Ohki, Hiroyuki Nishikawa, Makoto Takiyama

Research output: Contribution to journalArticlepeer-review

6 Citations (Scopus)

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Chemical Compounds

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