Thermal boundary resistance of W/Al2O3 interface in W/Al2O3/W three-layered thin film and its dependence on morphology

Shizuka Kawasaki, Yuichiro Yamashita, Nobuto Oka, Takashi Yagi, Junjun Jia, Naoyuki Taketoshi, Tetsuya Baba, Yuzo Shigesato

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5 Citations (Scopus)

Abstract

We investigated the dependence of the thermal boundary resistance of the W/Al2O3 interface in W/Al2O3/W three-layered thin films on the interface morphology. The layered structures, Al2O3 thin layers with thicknesses from 1 to 50nm covered by top and bottom W layers with a thickness of 100 nm, were fabricated by magnetron sputtering using a W target (99.99%) and an Al2O 3 target (99.99%). The fabrication of polycrystalline W and amorphous Al2O3 films was confirmed by structural analysis. The morphology of the bottom W layer/Al2O3 layer and Al 2O3 layer/top W layer interfaces showed a wavelike structure with a roughness of about 1 nm. Thermophysical properties and thermal boundary resistance were measured by a pulsed light heating thermoreflectance technique. The thermal boundary resistance of the W/Al2O3 interface was 1.9 × 10-9 m2KW-1, which corresponds to the thermal resistance of a 3.7-nm-thick Al2O 3 film or a 120-nm-thick W film.

Original languageEnglish
Article number065802
JournalJapanese journal of applied physics
Volume52
Issue number6 PART 1
DOIs
Publication statusPublished - 2013 Jun 1
Externally publishedYes

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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