Thermal boundary resistance of W/Al2O3 interface in W/Al2O3/W three-layered thin film and its dependence on morphology

Shizuka Kawasaki, Yuichiro Yamashita, Nobuto Oka, Takashi Yagi, Junjun Jia, Naoyuki Taketoshi, Tetsuya Baba, Yuzo Shigesato

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

We investigated the dependence of the thermal boundary resistance of the W/Al2O3 interface in W/Al2O3/W three-layered thin films on the interface morphology. The layered structures, Al2O3 thin layers with thicknesses from 1 to 50nm covered by top and bottom W layers with a thickness of 100 nm, were fabricated by magnetron sputtering using a W target (99.99%) and an Al2O 3 target (99.99%). The fabrication of polycrystalline W and amorphous Al2O3 films was confirmed by structural analysis. The morphology of the bottom W layer/Al2O3 layer and Al 2O3 layer/top W layer interfaces showed a wavelike structure with a roughness of about 1 nm. Thermophysical properties and thermal boundary resistance were measured by a pulsed light heating thermoreflectance technique. The thermal boundary resistance of the W/Al2O3 interface was 1.9 × 10-9 m2KW-1, which corresponds to the thermal resistance of a 3.7-nm-thick Al2O 3 film or a 120-nm-thick W film.

Original languageEnglish
Article number065802
JournalJapanese journal of applied physics
Volume52
Issue number6 PART 1
DOIs
Publication statusPublished - 2013 Jun 1
Externally publishedYes

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Thin films
thin films
Amorphous films
Thick films
Heat resistance
Structural analysis
Magnetron sputtering
Thermodynamic properties
Surface roughness
Heating
Fabrication
thermophysical properties
thermal resistance
structural analysis
Hot Temperature
magnetron sputtering
roughness
fabrication
heating

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

Cite this

Thermal boundary resistance of W/Al2O3 interface in W/Al2O3/W three-layered thin film and its dependence on morphology. / Kawasaki, Shizuka; Yamashita, Yuichiro; Oka, Nobuto; Yagi, Takashi; Jia, Junjun; Taketoshi, Naoyuki; Baba, Tetsuya; Shigesato, Yuzo.

In: Japanese journal of applied physics, Vol. 52, No. 6 PART 1, 065802, 01.06.2013.

Research output: Contribution to journalArticle

Kawasaki, S, Yamashita, Y, Oka, N, Yagi, T, Jia, J, Taketoshi, N, Baba, T & Shigesato, Y 2013, 'Thermal boundary resistance of W/Al2O3 interface in W/Al2O3/W three-layered thin film and its dependence on morphology', Japanese journal of applied physics, vol. 52, no. 6 PART 1, 065802. https://doi.org/10.7567/JJAP.52.065802
Kawasaki, Shizuka ; Yamashita, Yuichiro ; Oka, Nobuto ; Yagi, Takashi ; Jia, Junjun ; Taketoshi, Naoyuki ; Baba, Tetsuya ; Shigesato, Yuzo. / Thermal boundary resistance of W/Al2O3 interface in W/Al2O3/W three-layered thin film and its dependence on morphology. In: Japanese journal of applied physics. 2013 ; Vol. 52, No. 6 PART 1.
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