Thermal conductivity of sputtered amorphous Ge films

Tianzhuo Zhan, Yibin Xu, Masahiro Goto, Yoshihisa Tanaka, Ryozo Kato, Michiko Sasaki, Yutaka Kagawa

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13 Citations (Scopus)

Abstract

We measured the thermal conductivity of amorphous Ge films prepared by magnetron sputtering. The thermal conductivity was significantly higher than the value predicted by the minimum thermal conductivity model and increased with deposition temperature. We found that variations in sound velocity and Ge film density were not the main factors in the high thermal conductivity. Fast Fourier transform patterns of transmission electron micrographs revealed that short-range order in the Ge films was responsible for their high thermal conductivity. The results provide experimental evidences to understand the underlying nature of the variation of phonon mean free path in amorphous solids.

Original languageEnglish
Article number027126
JournalAIP Advances
Volume4
Issue number2
DOIs
Publication statusPublished - 2014 Feb
Externally publishedYes

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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    Zhan, T., Xu, Y., Goto, M., Tanaka, Y., Kato, R., Sasaki, M., & Kagawa, Y. (2014). Thermal conductivity of sputtered amorphous Ge films. AIP Advances, 4(2), [027126]. https://doi.org/10.1063/1.4867122