Thickness control of 3-dimensional mesoporous silica ultrathin films by wet-etching

Maho Kobayashi, Kyoka Susuki, Tomohiro Otani, Shinpei Enomoto, Haruo Otsuji, Yoshiyuki Kuroda, Hiroaki Wada, Atsushi Shimojima, Takayuki Homma, Kazuyuki Kuroda

    Research output: Contribution to journalArticle

    7 Citations (Scopus)

    Abstract

    The thickness of 3-dimensional (3D) mesoporous silica ultrathin films was controlled at a single-nanometer scale by wet-etching. A drop casting method with an aqueous etchant of ammonium fluoride was effective in etching the surfaces of films in the direction perpendicular to their substrates. The decrease in the film thickness depends on the interface tension of etching solutions. The wettability of thin films also influences the etching. CoPt nanodots were electrodeposited within ultrathin silica films on Ru substrates to form CoPt nanodot patterns.

    Original languageEnglish
    Pages (from-to)8321-8329
    Number of pages9
    JournalNanoscale
    Volume9
    Issue number24
    DOIs
    Publication statusPublished - 2017 Jun 28

    Fingerprint

    Thickness control
    Wet etching
    Ultrathin films
    Silicon Dioxide
    Etching
    Silica
    Substrates
    Surface tension
    Film thickness
    Wetting
    Casting
    Thin films

    ASJC Scopus subject areas

    • Materials Science(all)

    Cite this

    Kobayashi, M., Susuki, K., Otani, T., Enomoto, S., Otsuji, H., Kuroda, Y., ... Kuroda, K. (2017). Thickness control of 3-dimensional mesoporous silica ultrathin films by wet-etching. Nanoscale, 9(24), 8321-8329. https://doi.org/10.1039/c7nr01560g

    Thickness control of 3-dimensional mesoporous silica ultrathin films by wet-etching. / Kobayashi, Maho; Susuki, Kyoka; Otani, Tomohiro; Enomoto, Shinpei; Otsuji, Haruo; Kuroda, Yoshiyuki; Wada, Hiroaki; Shimojima, Atsushi; Homma, Takayuki; Kuroda, Kazuyuki.

    In: Nanoscale, Vol. 9, No. 24, 28.06.2017, p. 8321-8329.

    Research output: Contribution to journalArticle

    Kobayashi M, Susuki K, Otani T, Enomoto S, Otsuji H, Kuroda Y et al. Thickness control of 3-dimensional mesoporous silica ultrathin films by wet-etching. Nanoscale. 2017 Jun 28;9(24):8321-8329. https://doi.org/10.1039/c7nr01560g
    Kobayashi, Maho ; Susuki, Kyoka ; Otani, Tomohiro ; Enomoto, Shinpei ; Otsuji, Haruo ; Kuroda, Yoshiyuki ; Wada, Hiroaki ; Shimojima, Atsushi ; Homma, Takayuki ; Kuroda, Kazuyuki. / Thickness control of 3-dimensional mesoporous silica ultrathin films by wet-etching. In: Nanoscale. 2017 ; Vol. 9, No. 24. pp. 8321-8329.
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    AU - Wada, Hiroaki

    AU - Shimojima, Atsushi

    AU - Homma, Takayuki

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