Thickness control of 3-dimensional mesoporous silica ultrathin films by wet-etching

Maho Kobayashi, Kyoka Susuki, Tomohiro Otani, Shinpei Enomoto, Haruo Otsuji, Yoshiyuki Kuroda, Hiroaki Wada, Atsushi Shimojima, Takayuki Homma, Kazuyuki Kuroda

    Research output: Contribution to journalArticle

    9 Citations (Scopus)

    Abstract

    The thickness of 3-dimensional (3D) mesoporous silica ultrathin films was controlled at a single-nanometer scale by wet-etching. A drop casting method with an aqueous etchant of ammonium fluoride was effective in etching the surfaces of films in the direction perpendicular to their substrates. The decrease in the film thickness depends on the interface tension of etching solutions. The wettability of thin films also influences the etching. CoPt nanodots were electrodeposited within ultrathin silica films on Ru substrates to form CoPt nanodot patterns.

    Original languageEnglish
    Pages (from-to)8321-8329
    Number of pages9
    JournalNanoscale
    Volume9
    Issue number24
    DOIs
    Publication statusPublished - 2017 Jun 28

    ASJC Scopus subject areas

    • Materials Science(all)

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