Thin films of SmCo5 with very high perpendicular magnetic anisotropy

J. Sayama, K. Mizutani, Toru Asahi, Tetsuya Osaka

Research output: Contribution to journalArticle

67 Citations (Scopus)

Abstract

Thin films of SmCo5 with extraordinarily high perpendicular magnetic anisotropy were prepared by introducing a Cu/Ti dual underlayer and controlling the substrate temperature during the sputter deposition. Under optimized conditions, the magnetic anisotropy constant reached 4.0 × 107 erg/cm3, and the coercivity and the remanence ratio in the direction perpendicular to the film surface were 12.0 kOe and unity, respectively. The high perpendicular magnetic anisotropy is attributed to the high degree of preferred orientation of the c axis; the full width at half maximum in the rocking curve of SmCo5(002) reflection was 3.1°.

Original languageEnglish
Pages (from-to)5640-5642
Number of pages3
JournalApplied Physics Letters
Volume85
Issue number23
DOIs
Publication statusPublished - 2004 Dec 6

Fingerprint

anisotropy
thin films
remanence
coercivity
unity
curves
temperature

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Thin films of SmCo5 with very high perpendicular magnetic anisotropy. / Sayama, J.; Mizutani, K.; Asahi, Toru; Osaka, Tetsuya.

In: Applied Physics Letters, Vol. 85, No. 23, 06.12.2004, p. 5640-5642.

Research output: Contribution to journalArticle

@article{c291ea4e3d7e49b084ad9ec4a6144a1c,
title = "Thin films of SmCo5 with very high perpendicular magnetic anisotropy",
abstract = "Thin films of SmCo5 with extraordinarily high perpendicular magnetic anisotropy were prepared by introducing a Cu/Ti dual underlayer and controlling the substrate temperature during the sputter deposition. Under optimized conditions, the magnetic anisotropy constant reached 4.0 × 107 erg/cm3, and the coercivity and the remanence ratio in the direction perpendicular to the film surface were 12.0 kOe and unity, respectively. The high perpendicular magnetic anisotropy is attributed to the high degree of preferred orientation of the c axis; the full width at half maximum in the rocking curve of SmCo5(002) reflection was 3.1°.",
author = "J. Sayama and K. Mizutani and Toru Asahi and Tetsuya Osaka",
year = "2004",
month = "12",
day = "6",
doi = "10.1063/1.1829792",
language = "English",
volume = "85",
pages = "5640--5642",
journal = "Applied Physics Letters",
issn = "0003-6951",
publisher = "American Institute of Physics Publising LLC",
number = "23",

}

TY - JOUR

T1 - Thin films of SmCo5 with very high perpendicular magnetic anisotropy

AU - Sayama, J.

AU - Mizutani, K.

AU - Asahi, Toru

AU - Osaka, Tetsuya

PY - 2004/12/6

Y1 - 2004/12/6

N2 - Thin films of SmCo5 with extraordinarily high perpendicular magnetic anisotropy were prepared by introducing a Cu/Ti dual underlayer and controlling the substrate temperature during the sputter deposition. Under optimized conditions, the magnetic anisotropy constant reached 4.0 × 107 erg/cm3, and the coercivity and the remanence ratio in the direction perpendicular to the film surface were 12.0 kOe and unity, respectively. The high perpendicular magnetic anisotropy is attributed to the high degree of preferred orientation of the c axis; the full width at half maximum in the rocking curve of SmCo5(002) reflection was 3.1°.

AB - Thin films of SmCo5 with extraordinarily high perpendicular magnetic anisotropy were prepared by introducing a Cu/Ti dual underlayer and controlling the substrate temperature during the sputter deposition. Under optimized conditions, the magnetic anisotropy constant reached 4.0 × 107 erg/cm3, and the coercivity and the remanence ratio in the direction perpendicular to the film surface were 12.0 kOe and unity, respectively. The high perpendicular magnetic anisotropy is attributed to the high degree of preferred orientation of the c axis; the full width at half maximum in the rocking curve of SmCo5(002) reflection was 3.1°.

UR - http://www.scopus.com/inward/record.url?scp=12844288138&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=12844288138&partnerID=8YFLogxK

U2 - 10.1063/1.1829792

DO - 10.1063/1.1829792

M3 - Article

VL - 85

SP - 5640

EP - 5642

JO - Applied Physics Letters

JF - Applied Physics Letters

SN - 0003-6951

IS - 23

ER -