Three-dimensional lithography for rutile TiO 2 single crystals using swift heavy ions

Koichi Awazu, Makoto Fujimaki, Yoshimichi Ohki, Tetsuro Komatsubara

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    Abstract

    We have developed a nano-micro structure fabrication method in rutile TiO 2 single crystal by use of swift heavy-ion irradiation. The area where ions heavier than Cl ion accelerated with MeV-order high energy were irradiated was well etched by hydrofluoric acid, by comparison etching was not observed in the pristine TiO 2 single crystal. Noticed that the irradiated area could be etched to a depth at which the electronic stopping power of the ion decayed to a value of 6.2keV/nm. We also found that the value of the electronic stopping power was increased, eventually decreased against depth in TiO 2 single crystal with, e.g. 84.5MeV Ca ion. Using such a beam, inside of TiO 2 single crystal was selectively etched with 20% hydrofluoric acid, while the top surface of TiO 2 single crystal subjected to irradiation was not etched. Roughness of the new surface created in the single crystal was within 7nm with the atomic forth microscopy measurement.

    Original languageEnglish
    Title of host publicationMaterials Research Society Symposium - Proceedings
    EditorsR. Wehrspohn, F. Garcia-Vidal, M. Notomi, A. Scherer
    Pages69-74
    Number of pages6
    Volume797
    Publication statusPublished - 2003
    EventEngineered Porosity for Microphotonics and Plasmonics - Boston, MA., United States
    Duration: 2003 Dec 22003 Dec 4

    Other

    OtherEngineered Porosity for Microphotonics and Plasmonics
    CountryUnited States
    CityBoston, MA.
    Period03/12/203/12/4

    Fingerprint

    Heavy Ions
    Heavy ions
    Lithography
    Single crystals
    Hydrofluoric Acid
    Hydrofluoric acid
    Ions
    Power electronics
    Ion bombardment
    titanium dioxide
    Etching
    Microscopic examination
    Surface roughness
    Irradiation
    Fabrication
    Microstructure

    ASJC Scopus subject areas

    • Electronic, Optical and Magnetic Materials

    Cite this

    Awazu, K., Fujimaki, M., Ohki, Y., & Komatsubara, T. (2003). Three-dimensional lithography for rutile TiO 2 single crystals using swift heavy ions In R. Wehrspohn, F. Garcia-Vidal, M. Notomi, & A. Scherer (Eds.), Materials Research Society Symposium - Proceedings (Vol. 797, pp. 69-74)

    Three-dimensional lithography for rutile TiO 2 single crystals using swift heavy ions . / Awazu, Koichi; Fujimaki, Makoto; Ohki, Yoshimichi; Komatsubara, Tetsuro.

    Materials Research Society Symposium - Proceedings. ed. / R. Wehrspohn; F. Garcia-Vidal; M. Notomi; A. Scherer. Vol. 797 2003. p. 69-74.

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    Awazu, K, Fujimaki, M, Ohki, Y & Komatsubara, T 2003, Three-dimensional lithography for rutile TiO 2 single crystals using swift heavy ions in R Wehrspohn, F Garcia-Vidal, M Notomi & A Scherer (eds), Materials Research Society Symposium - Proceedings. vol. 797, pp. 69-74, Engineered Porosity for Microphotonics and Plasmonics, Boston, MA., United States, 03/12/2.
    Awazu K, Fujimaki M, Ohki Y, Komatsubara T. Three-dimensional lithography for rutile TiO 2 single crystals using swift heavy ions In Wehrspohn R, Garcia-Vidal F, Notomi M, Scherer A, editors, Materials Research Society Symposium - Proceedings. Vol. 797. 2003. p. 69-74
    Awazu, Koichi ; Fujimaki, Makoto ; Ohki, Yoshimichi ; Komatsubara, Tetsuro. / Three-dimensional lithography for rutile TiO 2 single crystals using swift heavy ions Materials Research Society Symposium - Proceedings. editor / R. Wehrspohn ; F. Garcia-Vidal ; M. Notomi ; A. Scherer. Vol. 797 2003. pp. 69-74
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