Three-dimensional micro-structures consisting of high aspect ratio inclined micro-pillars fabricated by simple photolithography

H. Sato, Y. Houshi, Shuichi Shoji

    Research output: Contribution to journalArticle

    15 Citations (Scopus)

    Abstract

    This paper presents a fabrication method of three-dimensional micro-structures consisting of high aspect ratio inclined micro-pillars using simple photolithography. The width and height of micro-pillars were 10 um and 200 μm (the aspect ratio was about 20). The SU-8 coated on the Cr patterned Pyrex glass substrate was exposed from the backside with an angle to fabricate inclined micro-pillars. The 3-D micro-structures were fabricated by repeating the backside exposure with different angles. The shape of the micro-structure was denned by the number of exposures and the UV irradiation angles. The complicated micro-structures were fabricated by multi-angle exposures around two axes, as well as around one axis.

    Original languageEnglish
    Pages (from-to)440-443
    Number of pages4
    JournalMicrosystem Technologies
    Volume10
    Issue number6-7
    DOIs
    Publication statusPublished - 2004 Oct

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    Photolithography
    photolithography
    high aspect ratio
    Aspect ratio
    microstructure
    Microstructure
    borosilicate glass
    aspect ratio
    Irradiation
    Fabrication
    Glass
    fabrication
    irradiation
    glass
    Substrates

    ASJC Scopus subject areas

    • Electrical and Electronic Engineering
    • Instrumentation

    Cite this

    Three-dimensional micro-structures consisting of high aspect ratio inclined micro-pillars fabricated by simple photolithography. / Sato, H.; Houshi, Y.; Shoji, Shuichi.

    In: Microsystem Technologies, Vol. 10, No. 6-7, 10.2004, p. 440-443.

    Research output: Contribution to journalArticle

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