Three-dimensional micro-structures consisting of high aspect ratio inclined micro-pillars fabricated by simple photolithography

H. Sato, Y. Houshi, S. Shoji

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16 Citations (Scopus)


This paper presents a fabrication method of three-dimensional micro-structures consisting of high aspect ratio inclined micro-pillars using simple photolithography. The width and height of micro-pillars were 10 um and 200 μm (the aspect ratio was about 20). The SU-8 coated on the Cr patterned Pyrex glass substrate was exposed from the backside with an angle to fabricate inclined micro-pillars. The 3-D micro-structures were fabricated by repeating the backside exposure with different angles. The shape of the micro-structure was denned by the number of exposures and the UV irradiation angles. The complicated micro-structures were fabricated by multi-angle exposures around two axes, as well as around one axis.

Original languageEnglish
Pages (from-to)440-443
Number of pages4
JournalMicrosystem Technologies
Issue number6-7
Publication statusPublished - 2004 Oct 1


ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Hardware and Architecture
  • Electrical and Electronic Engineering

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