Three-dimensional silicon fabrication using microloading effects with a rectangular aperture mask

Tomoyuki Takahata, Eiji Iwase, Kiyoshi Matsumoto, Isao Shimoyama

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

Three-dimensional silicon fabrication is demanded in optical lenses for collecting far infrared radiation. We propose a method for the fabrication of shapes, which have depths varying in the x and y directions, vertical walls and smooth surfaces. A mask design with rectangular apertures was used in a two-stage etching process consisting of anisotropic etching to rough out the three-dimensional shape followed by isotropic etching to smooth the surface. The relationship between the etching depth and area and the aspect ratio (length-to-height ratio) of the rectangular apertures was determined experimentally. Based on this relationship, we describe a procedure for designing rectangular apertures. We fabricated a convex microlens with a diameter of 150 μm and a height of 4.3 μm surrounded by a vertical wall. The arithmetic mean surface roughness of the microlens was 100 nm.

Original languageEnglish
Article number075022
JournalJournal of Micromechanics and Microengineering
Volume20
Issue number7
DOIs
Publication statusPublished - 2010
Externally publishedYes

Fingerprint

Silicon
Masks
Etching
Fabrication
Anisotropic etching
Aspect ratio
Lenses
Surface roughness
Infrared radiation

ASJC Scopus subject areas

  • Mechanical Engineering
  • Electrical and Electronic Engineering
  • Mechanics of Materials
  • Electronic, Optical and Magnetic Materials

Cite this

Three-dimensional silicon fabrication using microloading effects with a rectangular aperture mask. / Takahata, Tomoyuki; Iwase, Eiji; Matsumoto, Kiyoshi; Shimoyama, Isao.

In: Journal of Micromechanics and Microengineering, Vol. 20, No. 7, 075022, 2010.

Research output: Contribution to journalArticle

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