Threshold sheath potential for the nucleation and growth of cubic boron nitride by inductively coupled plasma enhanced chemical-vapor deposition

Satoshi Amagi, Daisuke Takahashi, Toyonobu Yoshida

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Abstract

The nucleation and growth conditions of c-BN films were studied in low-pressure inductively coupled plasma enhanced chemical-vapor deposition. The threshold sheath potentials needed for the nucleation and the growth of c-BN were sustained by two step Vsheath deposition. The threshold sheath potential for the growth Vsheathg was found to be significantly lower than the threshold value required for nucleation Vsheathn. Under our experimental condition, the values of Vsheathg and Vsheathn were found to be 45 and 65 V.

Original languageEnglish
Pages (from-to)946-948
Number of pages3
JournalApplied Physics Letters
Volume70
Issue number8
DOIs
Publication statusPublished - 1997 Feb 24

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ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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