Topographical and Electrochemical Characterization of Optically Smooth Zn Films Prepared by Physical Vapor Deposition

Yu Luo, Nelson Yee, Qingfang Shi, Baoxin Zhang, Yibo Mo, Gary S. Chottiner, Daniel Alberto Scherson

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

Optically smooth Zn films supported on Cu-coated glass and quarts substrates have been obtained by physical vapor deposition of Zn in metallic form. The method employed involves resistive heating of a Mo boat filled with high purity Zn shot in an Ar atmosphere at pressures of about 3-5 mTorr. Atomic force microscopy images revealed that the resulting Zn deposits consist of smooth features (rms roughness ca. 0.3 nm) with dimensions on the order of 200 nm. Preliminary results indicate that the electrochemical behavior of these films in strongly alkaline solutions is somewhat different than that observed for Zn in bulk commercial form.

Original languageEnglish
JournalJournal of the Electrochemical Society
Volume148
Issue number7
DOIs
Publication statusPublished - 2001 Jul 1
Externally publishedYes

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Renewable Energy, Sustainability and the Environment
  • Surfaces, Coatings and Films
  • Electrochemistry
  • Materials Chemistry

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