Toward a systematic methodology for modeling vapor deposition processes

Yuya Kajikawa, Hideki Mima, Katsumori Matsushima, Suguru Noda, Hiroshi Komiyama

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Vapor deposition is a complex process that includes gas-phase, surface, and solid-phase phenomena. Because of the complexity of the chemical and physical processes occurring in the vapor deposition process, it is difficult to form a comprehensive understanding and to control such systems to obtain the desirable structures, properties, and performance. To overcome these difficulties, a systematic methodology is necessary. In this work, we propose a systems approach to distinguish essential processes from other non-essential chemical and physical processes. We illustrate the systems approach using preferred orientation as an example. We also report our recent efforts to extract existing knowledge efficiently from the huge amounts of literature, using natural language processing (NLP). Our tools can support the literature-survey process that has traditionally been time consuming. Causal knowledge extraction from the literature is demonstrated with NLP.

Original languageEnglish
Title of host publicationProceedings - Electrochemical Society
EditorsA. Devi, R. Fischer, H. Parala, M.D. Allendorf, M. Hitchman
Pages29-35
Number of pages7
VolumePV 2005-09
Publication statusPublished - 2005
Externally publishedYes
Event15th European Conference on Chemical Vapor Deposition, EUROCVD-15 - Bochum
Duration: 2005 Sep 52005 Sep 9

Other

Other15th European Conference on Chemical Vapor Deposition, EUROCVD-15
CityBochum
Period05/9/505/9/9

Fingerprint

Vapor deposition
Processing
Control systems
Gases

ASJC Scopus subject areas

  • Engineering(all)

Cite this

Kajikawa, Y., Mima, H., Matsushima, K., Noda, S., & Komiyama, H. (2005). Toward a systematic methodology for modeling vapor deposition processes. In A. Devi, R. Fischer, H. Parala, M. D. Allendorf, & M. Hitchman (Eds.), Proceedings - Electrochemical Society (Vol. PV 2005-09, pp. 29-35)

Toward a systematic methodology for modeling vapor deposition processes. / Kajikawa, Yuya; Mima, Hideki; Matsushima, Katsumori; Noda, Suguru; Komiyama, Hiroshi.

Proceedings - Electrochemical Society. ed. / A. Devi; R. Fischer; H. Parala; M.D. Allendorf; M. Hitchman. Vol. PV 2005-09 2005. p. 29-35.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Kajikawa, Y, Mima, H, Matsushima, K, Noda, S & Komiyama, H 2005, Toward a systematic methodology for modeling vapor deposition processes. in A Devi, R Fischer, H Parala, MD Allendorf & M Hitchman (eds), Proceedings - Electrochemical Society. vol. PV 2005-09, pp. 29-35, 15th European Conference on Chemical Vapor Deposition, EUROCVD-15, Bochum, 05/9/5.
Kajikawa Y, Mima H, Matsushima K, Noda S, Komiyama H. Toward a systematic methodology for modeling vapor deposition processes. In Devi A, Fischer R, Parala H, Allendorf MD, Hitchman M, editors, Proceedings - Electrochemical Society. Vol. PV 2005-09. 2005. p. 29-35
Kajikawa, Yuya ; Mima, Hideki ; Matsushima, Katsumori ; Noda, Suguru ; Komiyama, Hiroshi. / Toward a systematic methodology for modeling vapor deposition processes. Proceedings - Electrochemical Society. editor / A. Devi ; R. Fischer ; H. Parala ; M.D. Allendorf ; M. Hitchman. Vol. PV 2005-09 2005. pp. 29-35
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