Transparent conductive Nb-doped TiO 2 films deposited by reactive dc sputtering using Ti-Nb alloy target, precisely controlled in the transition region using impedance feedback system

Nobuto Oka, Yuta Sanno, Junjun Jia, Shin Ichi Nakamura, Yuzo Shigesato

Research output: Contribution to journalArticle

15 Citations (Scopus)

Abstract

In this study, a stable reactive sputtering process using a Ti-Nb alloy target was achieved by applying a plasma impedance feedback system. High-quality transparent conductive Nb-doped TiO 2 (Nb:TiO 2 ) films were fabricated with high reproducibility. The films were deposited on unheated substrate and subsequently annealed at 873 K under vacuum conditions (below 6.0 × 10 -4 Pa) for 1 h. During reactive sputtering, the feedback system precisely controlled the oxidation of the target surface in the so-called transition region. The post-annealing process yielded polycrystalline Nb:TiO 2 films whose lattice defects decreased with increasing Nb concentration. An extremely low resistivity (7.2 × 10 -4 Ω cm) was achieved for Nb:TiO 2 film with 60-70% transmittance in the visible region. The reactive sputtering using Ti-Nb alloys is considered to be a strong candidate for industrial-scale thin-film deposition. Furthermore, it can also control the metal-oxygen stoichiometry of Nb:TiO 2 films precisely to achieve desirable properties for each industrial application.

Original languageEnglish
Pages (from-to)551-556
Number of pages6
JournalApplied Surface Science
Volume301
DOIs
Publication statusPublished - 2014 May 15
Externally publishedYes

Fingerprint

Reactive sputtering
sputtering
impedance
Feedback
Crystal defects
Stoichiometry
Industrial applications
stoichiometry
transmittance
Metals
Vacuum
Annealing
Oxygen
Plasmas
Thin films
Oxidation
vacuum
oxidation
electrical resistivity
annealing

Keywords

  • Orientation
  • Reactive sputtering
  • Thin films
  • Ti-Nb alloy target

ASJC Scopus subject areas

  • Surfaces, Coatings and Films

Cite this

Transparent conductive Nb-doped TiO 2 films deposited by reactive dc sputtering using Ti-Nb alloy target, precisely controlled in the transition region using impedance feedback system . / Oka, Nobuto; Sanno, Yuta; Jia, Junjun; Nakamura, Shin Ichi; Shigesato, Yuzo.

In: Applied Surface Science, Vol. 301, 15.05.2014, p. 551-556.

Research output: Contribution to journalArticle

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