Transparent conductive Nb-doped TiO 2 films deposited by reactive dc sputtering using Ti-Nb alloy target, precisely controlled in the transition region using impedance feedback system

Nobuto Oka*, Yuta Sanno, Junjun Jia, Shin Ichi Nakamura, Yuzo Shigesato

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

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