Ultrafast production of silicon via aluminothermic reduction of tetrachlorosilane in a thermal plasma jet

Kentaro Shinoda, Hideyuki Murakami, Yoshinari Sawabe, Kunio Saegusa

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

This paper proposed a new route for producing silicon at a high rate via the reduction of tetrachlorosilane with aluminum molten particles by utilizing a thermal plasma jet. High-purity aluminum particles melted and sprayed by an atmospheric dc plasma jet were reacted with tetrachlorosilane vapor. Silicon generation was confirmed in the reacted particles. The residence time was calculated to be a few milliseconds. The obtained results demonstrate the feasibility of the aluminothermic reduction process in a thermal plasma jet for rapid silicon production.

Original languageEnglish
Pages (from-to)61-64
Number of pages4
JournalChemical Engineering Journal
Volume198-199
DOIs
Publication statusPublished - 2012 Aug 1
Externally publishedYes

Fingerprint

Plasma Gases
Plasma jets
Silicon
silicon
Aluminum
plasma
aluminum
Molten materials
residence time
Vapors
silicon tetrachloride
Hot Temperature
particle

Keywords

  • Aluminothermic reduction
  • Silicon production
  • Tetrachlorosilane
  • Thermal plasma jet

ASJC Scopus subject areas

  • Chemistry(all)
  • Environmental Chemistry
  • Chemical Engineering(all)
  • Industrial and Manufacturing Engineering

Cite this

Ultrafast production of silicon via aluminothermic reduction of tetrachlorosilane in a thermal plasma jet. / Shinoda, Kentaro; Murakami, Hideyuki; Sawabe, Yoshinari; Saegusa, Kunio.

In: Chemical Engineering Journal, Vol. 198-199, 01.08.2012, p. 61-64.

Research output: Contribution to journalArticle

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