Ultrafast production of silicon via aluminothermic reduction of tetrachlorosilane in a thermal plasma jet

Kentaro Shinoda; Hideyuki Murakami; Yoshinari Sawabe; Kunio Saegusa

doi:10.1016/j.cej.2012.05.093

Ultrafast production of silicon via aluminothermic reduction of tetrachlorosilane in a thermal plasma jet

Kentaro Shinoda^*, Hideyuki Murakami, Yoshinari Sawabe, Kunio Saegusa

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

7 Citations (Scopus)

Abstract

This paper proposed a new route for producing silicon at a high rate via the reduction of tetrachlorosilane with aluminum molten particles by utilizing a thermal plasma jet. High-purity aluminum particles melted and sprayed by an atmospheric dc plasma jet were reacted with tetrachlorosilane vapor. Silicon generation was confirmed in the reacted particles. The residence time was calculated to be a few milliseconds. The obtained results demonstrate the feasibility of the aluminothermic reduction process in a thermal plasma jet for rapid silicon production.

Original language	English
Pages (from-to)	61-64
Number of pages	4
Journal	Chemical Engineering Journal
Volume	198-199
DOIs	https://doi.org/10.1016/j.cej.2012.05.093
Publication status	Published - 2012 Aug 1
Externally published	Yes

Keywords

Aluminothermic reduction
Silicon production
Tetrachlorosilane
Thermal plasma jet

ASJC Scopus subject areas

Chemistry(all)
Environmental Chemistry
Chemical Engineering(all)
Industrial and Manufacturing Engineering

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10.1016/j.cej.2012.05.093

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title = "Ultrafast production of silicon via aluminothermic reduction of tetrachlorosilane in a thermal plasma jet",

abstract = "This paper proposed a new route for producing silicon at a high rate via the reduction of tetrachlorosilane with aluminum molten particles by utilizing a thermal plasma jet. High-purity aluminum particles melted and sprayed by an atmospheric dc plasma jet were reacted with tetrachlorosilane vapor. Silicon generation was confirmed in the reacted particles. The residence time was calculated to be a few milliseconds. The obtained results demonstrate the feasibility of the aluminothermic reduction process in a thermal plasma jet for rapid silicon production.",

keywords = "Aluminothermic reduction, Silicon production, Tetrachlorosilane, Thermal plasma jet",

author = "Kentaro Shinoda and Hideyuki Murakami and Yoshinari Sawabe and Kunio Saegusa",

note = "Funding Information: A part of this project was financially supported by Sumitomo Chemical Co., Ltd. We would like to thank Dr. Takeshi Yoshikawa, the University of Tokyo, and Dr. Nobuo Hara, the National Institute of Advanced Industrial Science and Technology, for valuable discussion on the refining of Si from Si–Al melts and the rate kinetics, respectively. We also appreciate the support provided by Ms. Kaori Nakane, Mr. Akihiro Yamaguchi, Mr. Yoshito Yasui, and Mr. Ryohei Tansho in the experiments.",

year = "2012",

month = aug,

day = "1",

doi = "10.1016/j.cej.2012.05.093",

language = "English",

volume = "198-199",

pages = "61--64",

journal = "Chemical Engineering Journal",

issn = "1385-8947",

publisher = "Elsevier",

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TY - JOUR

T1 - Ultrafast production of silicon via aluminothermic reduction of tetrachlorosilane in a thermal plasma jet

AU - Shinoda, Kentaro

AU - Murakami, Hideyuki

AU - Sawabe, Yoshinari

AU - Saegusa, Kunio

N1 - Funding Information: A part of this project was financially supported by Sumitomo Chemical Co., Ltd. We would like to thank Dr. Takeshi Yoshikawa, the University of Tokyo, and Dr. Nobuo Hara, the National Institute of Advanced Industrial Science and Technology, for valuable discussion on the refining of Si from Si–Al melts and the rate kinetics, respectively. We also appreciate the support provided by Ms. Kaori Nakane, Mr. Akihiro Yamaguchi, Mr. Yoshito Yasui, and Mr. Ryohei Tansho in the experiments.

PY - 2012/8/1

Y1 - 2012/8/1

N2 - This paper proposed a new route for producing silicon at a high rate via the reduction of tetrachlorosilane with aluminum molten particles by utilizing a thermal plasma jet. High-purity aluminum particles melted and sprayed by an atmospheric dc plasma jet were reacted with tetrachlorosilane vapor. Silicon generation was confirmed in the reacted particles. The residence time was calculated to be a few milliseconds. The obtained results demonstrate the feasibility of the aluminothermic reduction process in a thermal plasma jet for rapid silicon production.

AB - This paper proposed a new route for producing silicon at a high rate via the reduction of tetrachlorosilane with aluminum molten particles by utilizing a thermal plasma jet. High-purity aluminum particles melted and sprayed by an atmospheric dc plasma jet were reacted with tetrachlorosilane vapor. Silicon generation was confirmed in the reacted particles. The residence time was calculated to be a few milliseconds. The obtained results demonstrate the feasibility of the aluminothermic reduction process in a thermal plasma jet for rapid silicon production.

KW - Aluminothermic reduction

KW - Silicon production

KW - Tetrachlorosilane

KW - Thermal plasma jet

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DO - 10.1016/j.cej.2012.05.093

M3 - Article

AN - SCOPUS:84864303893

SN - 1385-8947

VL - 198-199

SP - 61

EP - 64

JO - Chemical Engineering Journal

JF - Chemical Engineering Journal

ER -

Ultrafast production of silicon via aluminothermic reduction of tetrachlorosilane in a thermal plasma jet

Abstract

Keywords

ASJC Scopus subject areas

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