Ultrashallow junction formation by self-limiting LTP and its application to sub-65-nm node MOSFETs

Akio Shima, Hiroshi Ashihara, Atsushi Hiraiwa, Toshiyuki Mine, Yasushi Goto

Research output: Contribution to journalArticlepeer-review

15 Citations (Scopus)

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Physics & Astronomy

Chemical Compounds

Engineering & Materials Science