This chapter describes the phenomena of ultraviolet nanoimprint lithography (UV-NIL) transfer process, UV-NIL machine, UV-NIL materials, and evaluation of mold and transfer resin surface. In UV-NIL, a liquid resin having a low viscosity is used, thus, the required transfer pressure is lower than that of thermal NIL. The chapter describes the self-assembled monolayer (SAM) release agent and its coating method. Resin is classified according to the polymerization system into several types: radical polymerization type, ion polymerization type, and ene-thiol type. The properties of resins with different types of curing mechanism and developmental examples are described. The chapter describes what silane coupling agents are, and explains the mechanism by which the agents modify the surface of the substrate.
|Title of host publication||Nanoimprint Technology|
|Subtitle of host publication||Nanotransfer for Thermoplastic and Photocurable Polymers|
|Number of pages||78|
|Publication status||Published - 2013 Jun 18|
ASJC Scopus subject areas