Understanding the stability of a sputtered Al buffer layer for single-walled carbon nanotube forest synthesis

Toshiyuki Ohashi, Ryogo Kato, Toshio Tokune, Hiroshi Kawarada

Research output: Contribution to journalArticle

12 Citations (Scopus)

Abstract

We have clarified the reason that aluminum (Al) buffer layers prepared by sputtering on catalytic substrates are stable for single-walled carbon nanotube forest synthesis on chemical vapor deposition. We have focused on the difference between thermal evaporation and sputtering as the method for the preparation of the buffer layers and have analyzed the Al layers using X-ray photoelectron spectroscopy and transmission electron microscopy. Al layers produced by sputtering strongly suggest the formation of γ-alumina by aluminum hydroxides while those from thermal evaporation contain metallic Al. As a result a drastic structural change occurs during thermal annealing, making the buffer layer unstable.

Original languageEnglish
Pages (from-to)401-409
Number of pages9
JournalCarbon
Volume57
DOIs
Publication statusPublished - 2013 Jun 1

ASJC Scopus subject areas

  • Chemistry(all)
  • Materials Science(all)

Fingerprint Dive into the research topics of 'Understanding the stability of a sputtered Al buffer layer for single-walled carbon nanotube forest synthesis'. Together they form a unique fingerprint.

  • Cite this