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Uniform characteristics of Si-wire waveguide devices fabricated on 300 mm SOI wafers by using ArF immersion lithography
Yuichiro Tanushi, Tomohiro Kita, Munehiro Toyama, Miyoshi Seki, Keiji Koshino, Nobuyuki Yokoyama, Minoru Ohtsuka, Akinobu Sugiyama, Eiichi Ishitsuka, Tsukuru Sano, Tsuyoshi Horikawa, Hirohito Yamada
Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
5
Citations
(Scopus)