Unusually Abrupt Switching in Submicrometer Thin-Film Transistors Using a Polysilicon Film with Enhanced Grain Size

Noriyoshi Yamauchi, Noriyoshi Yamauchi, Rafael Reif

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

We report on unusually abrupt drain current change observed in polysilicon thin-film transistors (TFT's) with a channel length and width of 1 μm or smaller. The polysilicon used to fabricate the devices was deposited by LPCVD and the grain size of the film was enhanced by silicon ion implantation followed by a low-temperature anneal. The TFT's exhibited an abrupt drain current change of more than five orders of magnitude for a corresponding gate voltage change of less than 40 mV. A self-limiting positive feedback loop due to impact ionization currents and/or a parasitic bipolar effect are suggested as possible explanations.

Original languageEnglish
Pages (from-to)15-17
Number of pages3
JournalIEEE Electron Device Letters
Volume11
Issue number1
DOIs
Publication statusPublished - 1990 Jan
Externally publishedYes

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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