Use of a new anisotropic etching simulator on quartz crystal

M. Zhao, H. Oigawa, J. Wang, J. Ji, T. Ueda

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

This paper describes features of a new anisotropic etching simulator and its applications on predicting etching shape of quartz crystal. The simulator is suitable to predict etching profiles of two-dimensional initial shape which has a profile formed by straight lines. In this simulator, a program flow with uneven time step was used to furthest reduced the probability of improper shape prediction. We present here two examples of its application on both Z-plate and AT-plate quartz crystal to show its good performance.

Original languageEnglish
Title of host publication2011 16th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS'11
Pages450-453
Number of pages4
DOIs
Publication statusPublished - 2011
Event2011 16th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS'11 - Beijing
Duration: 2011 Jun 52011 Jun 9

Other

Other2011 16th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS'11
CityBeijing
Period11/6/511/6/9

Keywords

  • anisotropic etching
  • Micromaching
  • quartz crystal

ASJC Scopus subject areas

  • Hardware and Architecture
  • Electrical and Electronic Engineering

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  • Cite this

    Zhao, M., Oigawa, H., Wang, J., Ji, J., & Ueda, T. (2011). Use of a new anisotropic etching simulator on quartz crystal. In 2011 16th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS'11 (pp. 450-453). [5969578] https://doi.org/10.1109/TRANSDUCERS.2011.5969578