Use of a new anisotropic etching simulator on quartz crystal

M. Zhao; H. Oigawa; J. Wang; J. Ji; T. Ueda

doi:10.1109/TRANSDUCERS.2011.5969578

Use of a new anisotropic etching simulator on quartz crystal

M. Zhao^*, H. Oigawa, J. Wang, J. Ji, T. Ueda

^*Corresponding author for this work

Information, Production and Systems Research Center

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

3 Citations (Scopus)

Abstract

This paper describes features of a new anisotropic etching simulator and its applications on predicting etching shape of quartz crystal. The simulator is suitable to predict etching profiles of two-dimensional initial shape which has a profile formed by straight lines. In this simulator, a program flow with uneven time step was used to furthest reduced the probability of improper shape prediction. We present here two examples of its application on both Z-plate and AT-plate quartz crystal to show its good performance.

Original language	English
Title of host publication	2011 16th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS'11
Pages	450-453
Number of pages	4
DOIs	https://doi.org/10.1109/TRANSDUCERS.2011.5969578
Publication status	Published - 2011
Event	2011 16th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS'11 - Beijing Duration: 2011 Jun 5 → 2011 Jun 9

Other

Other	2011 16th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS'11
City	Beijing
Period	11/6/5 → 11/6/9

Keywords

anisotropic etching
Micromaching
quartz crystal

ASJC Scopus subject areas

Hardware and Architecture
Electrical and Electronic Engineering

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10.1109/TRANSDUCERS.2011.5969578

Cite this

Zhao, M, Oigawa, H, Wang, J, Ji, J & Ueda, T 2011, Use of a new anisotropic etching simulator on quartz crystal. in 2011 16th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS'11., 5969578, pp. 450-453, 2011 16th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS'11, Beijing, 11/6/5. https://doi.org/10.1109/TRANSDUCERS.2011.5969578

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AB - This paper describes features of a new anisotropic etching simulator and its applications on predicting etching shape of quartz crystal. The simulator is suitable to predict etching profiles of two-dimensional initial shape which has a profile formed by straight lines. In this simulator, a program flow with uneven time step was used to furthest reduced the probability of improper shape prediction. We present here two examples of its application on both Z-plate and AT-plate quartz crystal to show its good performance.

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BT - 2011 16th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS'11

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Y2 - 5 June 2011 through 9 June 2011

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Use of a new anisotropic etching simulator on quartz crystal

Abstract

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Keywords

ASJC Scopus subject areas

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