UV nanoimprint lithography and its application for nanodevices

Makoto Fukuhara; Hiroshi Ono; Tamano Hirasawa; Makoto Otaguchi; Nobuji Sakai; Jun Mizuno; Shuichi Shoji

doi:10.2494/photopolymer.20.549

UV nanoimprint lithography and its application for nanodevices

Makoto Fukuhara^*, Hiroshi Ono, Tamano Hirasawa, Makoto Otaguchi, Nobuji Sakai, Jun Mizuno, Shuichi Shoji

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

12 Citations (Scopus)

Abstract

Nanostructure fabrication process using ultraviolet nanoimprint lithography (UV-NIL) and electrodeposition were proposed. This method shows remarkable advantages in high throughput production and fabrication cost. For this process, the newly resin which endures wet process was developed. Co dot arrays of 220nm were fabricated by electrodeposition after UV-NIL. GaN structure of 300nm was also realized using Ni as an etching mask fabricated by proposed process.

Original language	English
Pages (from-to)	549-554
Number of pages	6
Journal	Journal of Photopolymer Science and Technology
Volume	20
Issue number	4
DOIs	https://doi.org/10.2494/photopolymer.20.549
Publication status	Published - 2007

Keywords

Electrodeposition
LED
Magnetic dot array
UV-nanoimprint

ASJC Scopus subject areas

Polymers and Plastics
Organic Chemistry
Materials Chemistry

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10.2494/photopolymer.20.549

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title = "UV nanoimprint lithography and its application for nanodevices",

abstract = "Nanostructure fabrication process using ultraviolet nanoimprint lithography (UV-NIL) and electrodeposition were proposed. This method shows remarkable advantages in high throughput production and fabrication cost. For this process, the newly resin which endures wet process was developed. Co dot arrays of 220nm were fabricated by electrodeposition after UV-NIL. GaN structure of 300nm was also realized using Ni as an etching mask fabricated by proposed process.",

keywords = "Electrodeposition, LED, Magnetic dot array, UV-nanoimprint",

author = "Makoto Fukuhara and Hiroshi Ono and Tamano Hirasawa and Makoto Otaguchi and Nobuji Sakai and Jun Mizuno and Shuichi Shoji",

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T1 - UV nanoimprint lithography and its application for nanodevices

AU - Fukuhara, Makoto

AU - Ono, Hiroshi

AU - Hirasawa, Tamano

AU - Otaguchi, Makoto

AU - Sakai, Nobuji

AU - Mizuno, Jun

AU - Shoji, Shuichi

PY - 2007

Y1 - 2007

N2 - Nanostructure fabrication process using ultraviolet nanoimprint lithography (UV-NIL) and electrodeposition were proposed. This method shows remarkable advantages in high throughput production and fabrication cost. For this process, the newly resin which endures wet process was developed. Co dot arrays of 220nm were fabricated by electrodeposition after UV-NIL. GaN structure of 300nm was also realized using Ni as an etching mask fabricated by proposed process.

AB - Nanostructure fabrication process using ultraviolet nanoimprint lithography (UV-NIL) and electrodeposition were proposed. This method shows remarkable advantages in high throughput production and fabrication cost. For this process, the newly resin which endures wet process was developed. Co dot arrays of 220nm were fabricated by electrodeposition after UV-NIL. GaN structure of 300nm was also realized using Ni as an etching mask fabricated by proposed process.

KW - Electrodeposition

KW - LED

KW - Magnetic dot array

KW - UV-nanoimprint

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UV nanoimprint lithography and its application for nanodevices

Abstract

Keywords

ASJC Scopus subject areas

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