UV nanoimprint lithography and its application for nanodevices

Makoto Fukuhara, Hiroshi Ono, Tamano Hirasawa, Makoto Otaguchi, Nobuji Sakai, Jun Mizuno, Shuichi Shoji

Research output: Contribution to journalArticle

10 Citations (Scopus)

Abstract

Nanostructure fabrication process using ultraviolet nanoimprint lithography (UV-NIL) and electrodeposition were proposed. This method shows remarkable advantages in high throughput production and fabrication cost. For this process, the newly resin which endures wet process was developed. Co dot arrays of 220nm were fabricated by electrodeposition after UV-NIL. GaN structure of 300nm was also realized using Ni as an etching mask fabricated by proposed process.

Original languageEnglish
Pages (from-to)549-554
Number of pages6
JournalJournal of Photopolymer Science and Technology
Volume20
Issue number4
DOIs
Publication statusPublished - 2007

Fingerprint

Nanoimprint lithography
Electrodeposition
Fabrication
Masks
Etching
Nanostructures
Resins
Throughput
Costs

Keywords

  • Electrodeposition
  • LED
  • Magnetic dot array
  • UV-nanoimprint

ASJC Scopus subject areas

  • Polymers and Plastics
  • Materials Chemistry

Cite this

UV nanoimprint lithography and its application for nanodevices. / Fukuhara, Makoto; Ono, Hiroshi; Hirasawa, Tamano; Otaguchi, Makoto; Sakai, Nobuji; Mizuno, Jun; Shoji, Shuichi.

In: Journal of Photopolymer Science and Technology, Vol. 20, No. 4, 2007, p. 549-554.

Research output: Contribution to journalArticle

Fukuhara, Makoto ; Ono, Hiroshi ; Hirasawa, Tamano ; Otaguchi, Makoto ; Sakai, Nobuji ; Mizuno, Jun ; Shoji, Shuichi. / UV nanoimprint lithography and its application for nanodevices. In: Journal of Photopolymer Science and Technology. 2007 ; Vol. 20, No. 4. pp. 549-554.
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