UV nanoimprint lithography and its application for nanodevices

Makoto Fukuhara*, Hiroshi Ono, Tamano Hirasawa, Makoto Otaguchi, Nobuji Sakai, Jun Mizuno, Shuichi Shoji

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

12 Citations (Scopus)


Nanostructure fabrication process using ultraviolet nanoimprint lithography (UV-NIL) and electrodeposition were proposed. This method shows remarkable advantages in high throughput production and fabrication cost. For this process, the newly resin which endures wet process was developed. Co dot arrays of 220nm were fabricated by electrodeposition after UV-NIL. GaN structure of 300nm was also realized using Ni as an etching mask fabricated by proposed process.

Original languageEnglish
Pages (from-to)549-554
Number of pages6
JournalJournal of Photopolymer Science and Technology
Issue number4
Publication statusPublished - 2007


  • Electrodeposition
  • LED
  • Magnetic dot array
  • UV-nanoimprint

ASJC Scopus subject areas

  • Polymers and Plastics
  • Organic Chemistry
  • Materials Chemistry


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