TY - JOUR
T1 - Vacuum Properties of TiN/Stainless Steel for Extremely High Vacuum
AU - Ikeda, Yoshinao
AU - Saito, Kazuya
AU - Tsukahara, Sonoko
AU - Ichimura, Shingo
AU - Kokubun, Kiyohide
AU - Hirata, Masahiro
N1 - Copyright:
Copyright 2017 Elsevier B.V., All rights reserved.
PY - 1998
Y1 - 1998
N2 - Coating of titanium nitride TiN film on stainless steel by hollow cathode discharge method under the controlled conditions has been developed and could reduce outgassing rate at the extremely high vacuum due to the hydrogen barrier effect of TiN1-3). This paper reports 1. further reduction of hydrogen permeation constant K of TiN film, 2. application of this technique to practical chamber preparation, and 3. reduction of outgassing rate of the resulting chamber. Hydrogen permeation constant of TiN films prepared by a laboratory equipment was decreased by improving the film structure to more dense and larger grains. The minimum hydrogen permeation constant K of TiN film at 500°C was 6 × 10-13Pa1/2·m2·s-1. Considering the above result, the practical condition of manufactuaring equipment was adjusted to make large samples for new XHV chambers fabricated for standard pressure measurement by Electrotechnical Laboratory in Japan. The resulting outgassing rate of a TiN coated chamber was measured by switching between two pumping paths (SPP) method at room temperature. At the ultimate pressure the outgassing rates of the stainless steel chamber was 3 × 10-12 Pa·m·s-1 after the prebaking of (430°C × 100 h + 500°C × 100 h) and after TiN coating on the chamber it decreased to less than 1 × 10-13 Pa·m·s-1, the lowest value obtained for stainless steel.
AB - Coating of titanium nitride TiN film on stainless steel by hollow cathode discharge method under the controlled conditions has been developed and could reduce outgassing rate at the extremely high vacuum due to the hydrogen barrier effect of TiN1-3). This paper reports 1. further reduction of hydrogen permeation constant K of TiN film, 2. application of this technique to practical chamber preparation, and 3. reduction of outgassing rate of the resulting chamber. Hydrogen permeation constant of TiN films prepared by a laboratory equipment was decreased by improving the film structure to more dense and larger grains. The minimum hydrogen permeation constant K of TiN film at 500°C was 6 × 10-13Pa1/2·m2·s-1. Considering the above result, the practical condition of manufactuaring equipment was adjusted to make large samples for new XHV chambers fabricated for standard pressure measurement by Electrotechnical Laboratory in Japan. The resulting outgassing rate of a TiN coated chamber was measured by switching between two pumping paths (SPP) method at room temperature. At the ultimate pressure the outgassing rates of the stainless steel chamber was 3 × 10-12 Pa·m·s-1 after the prebaking of (430°C × 100 h + 500°C × 100 h) and after TiN coating on the chamber it decreased to less than 1 × 10-13 Pa·m·s-1, the lowest value obtained for stainless steel.
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U2 - 10.3131/jvsj.41.507
DO - 10.3131/jvsj.41.507
M3 - Article
AN - SCOPUS:0031625640
SN - 0559-8516
VL - 41
SP - 507
EP - 511
JO - Shinku/Journal of the Vacuum Society of Japan
JF - Shinku/Journal of the Vacuum Society of Japan
IS - 5
ER -