Various bonding forms of OH groups in hydrogen-treated silica

Manabu Kitagawa, Hiroyuki Nishikawa, Yoshimichi Ohki, Yoshimasa Hama

    Research output: Contribution to journalArticle

    12 Citations (Scopus)

    Abstract

    The bonding state of OH groups in silica glasses is studied by examining infrared absorption spectra and thermal annealing characteristics of γ-induced paramagnetic detect centers. When an oxygen-rich silica is treated by hydrogen, OH groups exist in the form of those hydrogen-bonded with nonbridging oxygen (≡Si-O- - - -H-O-Si≡) besides the forms of H2O and ≡Si-O-H.

    Original languageEnglish
    Pages (from-to)2378-2380
    Number of pages3
    JournalJournal of Applied Physics
    Volume74
    Issue number4
    DOIs
    Publication statusPublished - 1993

    Fingerprint

    silicon dioxide
    silica glass
    oxygen
    hydrogen
    infrared absorption
    infrared spectra
    absorption spectra
    annealing

    ASJC Scopus subject areas

    • Physics and Astronomy (miscellaneous)

    Cite this

    Various bonding forms of OH groups in hydrogen-treated silica. / Kitagawa, Manabu; Nishikawa, Hiroyuki; Ohki, Yoshimichi; Hama, Yoshimasa.

    In: Journal of Applied Physics, Vol. 74, No. 4, 1993, p. 2378-2380.

    Research output: Contribution to journalArticle

    Kitagawa, Manabu ; Nishikawa, Hiroyuki ; Ohki, Yoshimichi ; Hama, Yoshimasa. / Various bonding forms of OH groups in hydrogen-treated silica. In: Journal of Applied Physics. 1993 ; Vol. 74, No. 4. pp. 2378-2380.
    @article{877a6ee52f084d4d8af94d4bbdc87c61,
    title = "Various bonding forms of OH groups in hydrogen-treated silica",
    abstract = "The bonding state of OH groups in silica glasses is studied by examining infrared absorption spectra and thermal annealing characteristics of γ-induced paramagnetic detect centers. When an oxygen-rich silica is treated by hydrogen, OH groups exist in the form of those hydrogen-bonded with nonbridging oxygen (≡Si-O- - - -H-O-Si≡) besides the forms of H2O and ≡Si-O-H.",
    author = "Manabu Kitagawa and Hiroyuki Nishikawa and Yoshimichi Ohki and Yoshimasa Hama",
    year = "1993",
    doi = "10.1063/1.355295",
    language = "English",
    volume = "74",
    pages = "2378--2380",
    journal = "Journal of Applied Physics",
    issn = "0021-8979",
    publisher = "American Institute of Physics Publising LLC",
    number = "4",

    }

    TY - JOUR

    T1 - Various bonding forms of OH groups in hydrogen-treated silica

    AU - Kitagawa, Manabu

    AU - Nishikawa, Hiroyuki

    AU - Ohki, Yoshimichi

    AU - Hama, Yoshimasa

    PY - 1993

    Y1 - 1993

    N2 - The bonding state of OH groups in silica glasses is studied by examining infrared absorption spectra and thermal annealing characteristics of γ-induced paramagnetic detect centers. When an oxygen-rich silica is treated by hydrogen, OH groups exist in the form of those hydrogen-bonded with nonbridging oxygen (≡Si-O- - - -H-O-Si≡) besides the forms of H2O and ≡Si-O-H.

    AB - The bonding state of OH groups in silica glasses is studied by examining infrared absorption spectra and thermal annealing characteristics of γ-induced paramagnetic detect centers. When an oxygen-rich silica is treated by hydrogen, OH groups exist in the form of those hydrogen-bonded with nonbridging oxygen (≡Si-O- - - -H-O-Si≡) besides the forms of H2O and ≡Si-O-H.

    UR - http://www.scopus.com/inward/record.url?scp=0000677257&partnerID=8YFLogxK

    UR - http://www.scopus.com/inward/citedby.url?scp=0000677257&partnerID=8YFLogxK

    U2 - 10.1063/1.355295

    DO - 10.1063/1.355295

    M3 - Article

    VL - 74

    SP - 2378

    EP - 2380

    JO - Journal of Applied Physics

    JF - Journal of Applied Physics

    SN - 0021-8979

    IS - 4

    ER -