Very high yield growth of vertically aligned single-walled carbon nanotubes by point-arc microwave plasma CVD

Guofang Zhong, Takayuki Iwasaki, Kotaro Honda, Yukio Furukawa, Iwao Ohdomari, Hiroshi Kawarada

Research output: Contribution to journalArticle

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A very high yield growth of extremely dense and vertically aligned single-walled carbon nanotubes (SWNT) by Point-Arc Microwave plasma CVD were analyzed. It was observed that SWNT film thickness increases continuously with the growth time, suggesting an almost unlimited life time for the catalyst. Thin top Al2O3 coating plays a very important role in the aligned growth of extremely dense SWNTs. The point-arc MPCVD method is preferable for controlled growth of SWNTs at a low temperature on Si substrates coated with a sandwich-like coating structure.

Original languageEnglish
Pages (from-to)127-130
Number of pages4
JournalChemical Vapor Deposition
Issue number3
Publication statusPublished - 2005 Mar 1


ASJC Scopus subject areas

  • Chemistry(all)
  • Surfaces and Interfaces
  • Process Chemistry and Technology

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