Visible-light active thin-film WO3 photocatalyst with controlled high-rate deposition by low-damage reactive-gas-flow sputtering

Nobuto Oka*, Akiyo Murata, Shin Ichi Nakamura, Junjun Jia, Yoshinori Iwabuchi, Hidefumi Kotsubo, Yuzo Shigesato

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

19 Citations (Scopus)

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Engineering & Materials Science

Chemical Compounds