W-polymetal gate with low W/poly-Si interface resistance for high-speed/high-density embedded memory

Tomohiro Yamashita*, Yukio Nishida, Kiyoshi Hayashi, Takahisa Eimori, Masahide Inuishi, Yuzuru Ohji

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

13 Citations (Scopus)

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Engineering & Materials Science

Physics & Astronomy