Wettability control of a polymer surface through 126 nm vacuum ultraviolet light irradiation

Atsushi Hozumi; Naoto Shirahata; Youichiro Nakanishi; Shuuichi Asakura; Akio Fuwa

doi:10.1116/1.1701867

Wettability control of a polymer surface through 126 nm vacuum ultraviolet light irradiation

Atsushi Hozumi^*, Naoto Shirahata, Youichiro Nakanishi, Shuuichi Asakura, Akio Fuwa

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

17 Citations (Scopus)

Abstract

The wettability control of poly (methyl methacrylate)(PMMA) was analyzed using a 126 nm vacuum ultraviolet (VUV) irradiation. The samples were exposed to 126 nm VUV light in air over the pressure range of 2 × 10 ^∓4∓10⁵. It was observed that the minimum water contact angles were about 50°, 33° and 64° when the samples were treated at 10, 10³, and 10⁵ Pa. It was also observed through 172 nm VUV irradiation that the values were larger than the PMMA substrates. After 126 nm VUV irradiation was conducted under the high vacuum condition of 2×10^∓4 Pa, it was found that the PMMA substrate surface became carbon-rich.

Original language	English
Pages (from-to)	1309-1314
Number of pages	6
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	22
Issue number	4
DOIs	https://doi.org/10.1116/1.1701867
Publication status	Published - 2004 Jul

ASJC Scopus subject areas

Surfaces, Coatings and Films
Surfaces and Interfaces
Physics and Astronomy (miscellaneous)

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@article{37c1aac7ff2f4abb8facba62496f309a,

title = "Wettability control of a polymer surface through 126 nm vacuum ultraviolet light irradiation",

abstract = "The wettability control of poly (methyl methacrylate)(PMMA) was analyzed using a 126 nm vacuum ultraviolet (VUV) irradiation. The samples were exposed to 126 nm VUV light in air over the pressure range of 2 × 10 ∓4∓105. It was observed that the minimum water contact angles were about 50°, 33° and 64° when the samples were treated at 10, 103, and 105 Pa. It was also observed through 172 nm VUV irradiation that the values were larger than the PMMA substrates. After 126 nm VUV irradiation was conducted under the high vacuum condition of 2×10∓4 Pa, it was found that the PMMA substrate surface became carbon-rich.",

author = "Atsushi Hozumi and Naoto Shirahata and Youichiro Nakanishi and Shuuichi Asakura and Akio Fuwa",

year = "2004",

month = jul,

doi = "10.1116/1.1701867",

language = "English",

volume = "22",

pages = "1309--1314",

journal = "Journal of Vacuum Science and Technology A",

issn = "0734-2101",

publisher = "AVS Science and Technology Society",

number = "4",

}

TY - JOUR

T1 - Wettability control of a polymer surface through 126 nm vacuum ultraviolet light irradiation

AU - Hozumi, Atsushi

AU - Shirahata, Naoto

AU - Nakanishi, Youichiro

AU - Asakura, Shuuichi

AU - Fuwa, Akio

PY - 2004/7

Y1 - 2004/7

N2 - The wettability control of poly (methyl methacrylate)(PMMA) was analyzed using a 126 nm vacuum ultraviolet (VUV) irradiation. The samples were exposed to 126 nm VUV light in air over the pressure range of 2 × 10 ∓4∓105. It was observed that the minimum water contact angles were about 50°, 33° and 64° when the samples were treated at 10, 103, and 105 Pa. It was also observed through 172 nm VUV irradiation that the values were larger than the PMMA substrates. After 126 nm VUV irradiation was conducted under the high vacuum condition of 2×10∓4 Pa, it was found that the PMMA substrate surface became carbon-rich.

AB - The wettability control of poly (methyl methacrylate)(PMMA) was analyzed using a 126 nm vacuum ultraviolet (VUV) irradiation. The samples were exposed to 126 nm VUV light in air over the pressure range of 2 × 10 ∓4∓105. It was observed that the minimum water contact angles were about 50°, 33° and 64° when the samples were treated at 10, 103, and 105 Pa. It was also observed through 172 nm VUV irradiation that the values were larger than the PMMA substrates. After 126 nm VUV irradiation was conducted under the high vacuum condition of 2×10∓4 Pa, it was found that the PMMA substrate surface became carbon-rich.

UR - http://www.scopus.com/inward/record.url?scp=4444384499&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=4444384499&partnerID=8YFLogxK

U2 - 10.1116/1.1701867

DO - 10.1116/1.1701867

M3 - Article

AN - SCOPUS:4444384499

SN - 0734-2101

VL - 22

SP - 1309

EP - 1314

JO - Journal of Vacuum Science and Technology A

JF - Journal of Vacuum Science and Technology A

IS - 4

ER -

Wettability control of a polymer surface through 126 nm vacuum ultraviolet light irradiation

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