Wettability control of a polymer surface through 126 nm vacuum ultraviolet light irradiation

Atsushi Hozumi; Naoto Shirahata; Youichiro Nakanishi; Shuuichi Asakura; Akio Fuwa

doi:10.1116/1.1701867

Wettability control of a polymer surface through 126 nm vacuum ultraviolet light irradiation

Atsushi Hozumi, Naoto Shirahata, Youichiro Nakanishi, Shuuichi Asakura, Akio Fuwa

Research output: Contribution to journal › Article › peer-review

16 Citations (Scopus)

Abstract

The wettability control of poly (methyl methacrylate)(PMMA) was analyzed using a 126 nm vacuum ultraviolet (VUV) irradiation. The samples were exposed to 126 nm VUV light in air over the pressure range of 2 × 10 ^∓4∓10⁵. It was observed that the minimum water contact angles were about 50°, 33° and 64° when the samples were treated at 10, 10³, and 10⁵ Pa. It was also observed through 172 nm VUV irradiation that the values were larger than the PMMA substrates. After 126 nm VUV irradiation was conducted under the high vacuum condition of 2×10^∓4 Pa, it was found that the PMMA substrate surface became carbon-rich.

Original language	English
Pages (from-to)	1309-1314
Number of pages	6
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	22
Issue number	4
DOIs	https://doi.org/10.1116/1.1701867
Publication status	Published - 2004 Jul

ASJC Scopus subject areas

Surfaces, Coatings and Films
Surfaces and Interfaces
Physics and Astronomy (miscellaneous)

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abstract = "The wettability control of poly (methyl methacrylate)(PMMA) was analyzed using a 126 nm vacuum ultraviolet (VUV) irradiation. The samples were exposed to 126 nm VUV light in air over the pressure range of 2 × 10 ∓4∓105. It was observed that the minimum water contact angles were about 50°, 33° and 64° when the samples were treated at 10, 103, and 105 Pa. It was also observed through 172 nm VUV irradiation that the values were larger than the PMMA substrates. After 126 nm VUV irradiation was conducted under the high vacuum condition of 2×10∓4 Pa, it was found that the PMMA substrate surface became carbon-rich.",

author = "Atsushi Hozumi and Naoto Shirahata and Youichiro Nakanishi and Shuuichi Asakura and Akio Fuwa",

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AU - Hozumi, Atsushi

AU - Shirahata, Naoto

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AU - Fuwa, Akio

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AB - The wettability control of poly (methyl methacrylate)(PMMA) was analyzed using a 126 nm vacuum ultraviolet (VUV) irradiation. The samples were exposed to 126 nm VUV light in air over the pressure range of 2 × 10 ∓4∓105. It was observed that the minimum water contact angles were about 50°, 33° and 64° when the samples were treated at 10, 103, and 105 Pa. It was also observed through 172 nm VUV irradiation that the values were larger than the PMMA substrates. After 126 nm VUV irradiation was conducted under the high vacuum condition of 2×10∓4 Pa, it was found that the PMMA substrate surface became carbon-rich.

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Wettability control of a polymer surface through 126 nm vacuum ultraviolet light irradiation

Abstract

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