Work function of polycrystalline Ag, Au and Al

M. Uda, A. Nakamura, Tomoyuki Yamamoto, Y. Fujimoto

    Research output: Contribution to journalArticle

    82 Citations (Scopus)

    Abstract

    Work functions of polycrystalline Ag, Au and Al films were measured by the photoelectric method, which were deposited on amorphous quartz. These films were preferentially oriented, and an oriented plane, i.e. (111), and a degree of orientation were determined precisely by X-ray diffraction. The work functions of well-defined polycrystalline Ag increased from 4.35 to 4.64 eV after annealing at 500°C, but those of Au and Al remain almost unchanged after annealing at 350°C, i.e. 5.40 and 4.30 eV, respectively. The low work function of Ag before annealing was explained by the appearance of the local density of state near the Fermi edge of Ag, which is due to formation of the stacking fault in f.c.c. Ag during deposition.

    Original languageEnglish
    Pages (from-to)643-648
    Number of pages6
    JournalJournal of Electron Spectroscopy and Related Phenomena
    Volume88-91
    Publication statusPublished - 1998 Mar

    Fingerprint

    Annealing
    annealing
    Quartz
    Stacking faults
    crystal defects
    quartz
    X ray diffraction
    diffraction
    x rays

    Keywords

    • Ag
    • Annealing
    • Polycrystal
    • Preferred orientation
    • Stacking fault
    • Work function

    ASJC Scopus subject areas

    • Physical and Theoretical Chemistry
    • Spectroscopy
    • Atomic and Molecular Physics, and Optics
    • Surfaces and Interfaces

    Cite this

    Work function of polycrystalline Ag, Au and Al. / Uda, M.; Nakamura, A.; Yamamoto, Tomoyuki; Fujimoto, Y.

    In: Journal of Electron Spectroscopy and Related Phenomena, Vol. 88-91, 03.1998, p. 643-648.

    Research output: Contribution to journalArticle

    @article{acb4ade61a9249ccb8647c6694e35edc,
    title = "Work function of polycrystalline Ag, Au and Al",
    abstract = "Work functions of polycrystalline Ag, Au and Al films were measured by the photoelectric method, which were deposited on amorphous quartz. These films were preferentially oriented, and an oriented plane, i.e. (111), and a degree of orientation were determined precisely by X-ray diffraction. The work functions of well-defined polycrystalline Ag increased from 4.35 to 4.64 eV after annealing at 500°C, but those of Au and Al remain almost unchanged after annealing at 350°C, i.e. 5.40 and 4.30 eV, respectively. The low work function of Ag before annealing was explained by the appearance of the local density of state near the Fermi edge of Ag, which is due to formation of the stacking fault in f.c.c. Ag during deposition.",
    keywords = "Ag, Annealing, Polycrystal, Preferred orientation, Stacking fault, Work function",
    author = "M. Uda and A. Nakamura and Tomoyuki Yamamoto and Y. Fujimoto",
    year = "1998",
    month = "3",
    language = "English",
    volume = "88-91",
    pages = "643--648",
    journal = "Journal of Electron Spectroscopy and Related Phenomena",
    issn = "0368-2048",
    publisher = "Elsevier",

    }

    TY - JOUR

    T1 - Work function of polycrystalline Ag, Au and Al

    AU - Uda, M.

    AU - Nakamura, A.

    AU - Yamamoto, Tomoyuki

    AU - Fujimoto, Y.

    PY - 1998/3

    Y1 - 1998/3

    N2 - Work functions of polycrystalline Ag, Au and Al films were measured by the photoelectric method, which were deposited on amorphous quartz. These films were preferentially oriented, and an oriented plane, i.e. (111), and a degree of orientation were determined precisely by X-ray diffraction. The work functions of well-defined polycrystalline Ag increased from 4.35 to 4.64 eV after annealing at 500°C, but those of Au and Al remain almost unchanged after annealing at 350°C, i.e. 5.40 and 4.30 eV, respectively. The low work function of Ag before annealing was explained by the appearance of the local density of state near the Fermi edge of Ag, which is due to formation of the stacking fault in f.c.c. Ag during deposition.

    AB - Work functions of polycrystalline Ag, Au and Al films were measured by the photoelectric method, which were deposited on amorphous quartz. These films were preferentially oriented, and an oriented plane, i.e. (111), and a degree of orientation were determined precisely by X-ray diffraction. The work functions of well-defined polycrystalline Ag increased from 4.35 to 4.64 eV after annealing at 500°C, but those of Au and Al remain almost unchanged after annealing at 350°C, i.e. 5.40 and 4.30 eV, respectively. The low work function of Ag before annealing was explained by the appearance of the local density of state near the Fermi edge of Ag, which is due to formation of the stacking fault in f.c.c. Ag during deposition.

    KW - Ag

    KW - Annealing

    KW - Polycrystal

    KW - Preferred orientation

    KW - Stacking fault

    KW - Work function

    UR - http://www.scopus.com/inward/record.url?scp=17744409636&partnerID=8YFLogxK

    UR - http://www.scopus.com/inward/citedby.url?scp=17744409636&partnerID=8YFLogxK

    M3 - Article

    AN - SCOPUS:17744409636

    VL - 88-91

    SP - 643

    EP - 648

    JO - Journal of Electron Spectroscopy and Related Phenomena

    JF - Journal of Electron Spectroscopy and Related Phenomena

    SN - 0368-2048

    ER -