X-ray absorption near edge structures of silicon nitride thin film by pulsed laser deposition

Engineering & Materials Science

• X ray absorption 100%
• Pulsed laser deposition 88%
• Silicon nitride 69%
• Thin films 54%
• Excimer lasers 44%
• Crystalline materials 30%
• Crystals 28%
• X ray diffraction 28%
• Aluminum oxide 27%
• Gases 16%

Chemical Compounds

• Pulsed Laser Deposition 75%
• X-Ray Absorption Near Edge Structure 71%
• Nitride 55%
• Excimer 31%
• Microcrystallinity 31%
• Amorphous Material 19%
• Pressure 16%
• Gas 15%
• X-Ray Diffraction 14%

Physics & Astronomy

• silicon nitrides 55%
• pulsed laser deposition 54%
• thin films 29%
• excimer lasers 28%
• gas pressure 27%
• x rays 25%
• diffraction 15%
• crystals 13%