X-ray photoelectron spectroscopy and morphological studies of polycrystalline nickel surfaces exposed to anhydrous HF

George G. Totir, Gary S. Chottiner, Christopher L. Gross, W. Ves Childs, Daniel Alberto Scherson

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

The reactivity of nominally clean polycrystalline Ni toward gas-phase and liquid anhydrous hydrofluoric acid (AHF) has been examined by X-ray photoelectron spectroscopy (XPS). To avoid contamination with atmospheric components, experiments were carried out using a portable ultrahigh vacuum (UHV)-compatible chamber to transfer Ni specimens between a UHV system that houses the XPS spectrometer and an additional UHV-compatible chamber where the actual exposures were performed. For exposures of ca. 10 min, the extent of surface oxidation of clean Ni to form NiF2, as calculated from Ni 2p and F 1s XPS spectra, was found to be significantly higher for gas-, compared to liquid-phase AHF. Thin (ca. 100 nm), mirror-like Ni films sputtered onto the surface of a sapphire disk yielded upon exposure to gas-phase AHF (after contact with the laboratory atmosphere) scanning electron microscope images displaying a coherent, patchy structure with raised junctures. This behavior was ascribed to internal compressive stresses induced by the formation of a nickel(II) fluoride layer on the metal surface.

Original languageEnglish
Pages (from-to)4212-4216
Number of pages5
JournalJournal of the Electrochemical Society
Volume147
Issue number11
DOIs
Publication statusPublished - 2000 Nov 1
Externally publishedYes

Fingerprint

Hydrofluoric Acid
Hydrofluoric acid
Ultrahigh vacuum
Nickel
X ray photoelectron spectroscopy
Gases
Aluminum Oxide
Liquids
Fluorides
Compressive stress
Sapphire
Contacts (fluid mechanics)
Spectrometers
Residual stresses
Mirrors
Contamination
Electron microscopes
Metals
Scanning
Oxidation

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Renewable Energy, Sustainability and the Environment
  • Surfaces, Coatings and Films
  • Electrochemistry
  • Materials Chemistry

Cite this

X-ray photoelectron spectroscopy and morphological studies of polycrystalline nickel surfaces exposed to anhydrous HF. / Totir, George G.; Chottiner, Gary S.; Gross, Christopher L.; Childs, W. Ves; Scherson, Daniel Alberto.

In: Journal of the Electrochemical Society, Vol. 147, No. 11, 01.11.2000, p. 4212-4216.

Research output: Contribution to journalArticle

Totir, George G. ; Chottiner, Gary S. ; Gross, Christopher L. ; Childs, W. Ves ; Scherson, Daniel Alberto. / X-ray photoelectron spectroscopy and morphological studies of polycrystalline nickel surfaces exposed to anhydrous HF. In: Journal of the Electrochemical Society. 2000 ; Vol. 147, No. 11. pp. 4212-4216.
@article{b59f76fe32504ba79ed162f8cd5df4d0,
title = "X-ray photoelectron spectroscopy and morphological studies of polycrystalline nickel surfaces exposed to anhydrous HF",
abstract = "The reactivity of nominally clean polycrystalline Ni toward gas-phase and liquid anhydrous hydrofluoric acid (AHF) has been examined by X-ray photoelectron spectroscopy (XPS). To avoid contamination with atmospheric components, experiments were carried out using a portable ultrahigh vacuum (UHV)-compatible chamber to transfer Ni specimens between a UHV system that houses the XPS spectrometer and an additional UHV-compatible chamber where the actual exposures were performed. For exposures of ca. 10 min, the extent of surface oxidation of clean Ni to form NiF2, as calculated from Ni 2p and F 1s XPS spectra, was found to be significantly higher for gas-, compared to liquid-phase AHF. Thin (ca. 100 nm), mirror-like Ni films sputtered onto the surface of a sapphire disk yielded upon exposure to gas-phase AHF (after contact with the laboratory atmosphere) scanning electron microscope images displaying a coherent, patchy structure with raised junctures. This behavior was ascribed to internal compressive stresses induced by the formation of a nickel(II) fluoride layer on the metal surface.",
author = "Totir, {George G.} and Chottiner, {Gary S.} and Gross, {Christopher L.} and Childs, {W. Ves} and Scherson, {Daniel Alberto}",
year = "2000",
month = "11",
day = "1",
doi = "10.1149/1.1394043",
language = "English",
volume = "147",
pages = "4212--4216",
journal = "Journal of the Electrochemical Society",
issn = "0013-4651",
publisher = "Electrochemical Society, Inc.",
number = "11",

}

TY - JOUR

T1 - X-ray photoelectron spectroscopy and morphological studies of polycrystalline nickel surfaces exposed to anhydrous HF

AU - Totir, George G.

AU - Chottiner, Gary S.

AU - Gross, Christopher L.

AU - Childs, W. Ves

AU - Scherson, Daniel Alberto

PY - 2000/11/1

Y1 - 2000/11/1

N2 - The reactivity of nominally clean polycrystalline Ni toward gas-phase and liquid anhydrous hydrofluoric acid (AHF) has been examined by X-ray photoelectron spectroscopy (XPS). To avoid contamination with atmospheric components, experiments were carried out using a portable ultrahigh vacuum (UHV)-compatible chamber to transfer Ni specimens between a UHV system that houses the XPS spectrometer and an additional UHV-compatible chamber where the actual exposures were performed. For exposures of ca. 10 min, the extent of surface oxidation of clean Ni to form NiF2, as calculated from Ni 2p and F 1s XPS spectra, was found to be significantly higher for gas-, compared to liquid-phase AHF. Thin (ca. 100 nm), mirror-like Ni films sputtered onto the surface of a sapphire disk yielded upon exposure to gas-phase AHF (after contact with the laboratory atmosphere) scanning electron microscope images displaying a coherent, patchy structure with raised junctures. This behavior was ascribed to internal compressive stresses induced by the formation of a nickel(II) fluoride layer on the metal surface.

AB - The reactivity of nominally clean polycrystalline Ni toward gas-phase and liquid anhydrous hydrofluoric acid (AHF) has been examined by X-ray photoelectron spectroscopy (XPS). To avoid contamination with atmospheric components, experiments were carried out using a portable ultrahigh vacuum (UHV)-compatible chamber to transfer Ni specimens between a UHV system that houses the XPS spectrometer and an additional UHV-compatible chamber where the actual exposures were performed. For exposures of ca. 10 min, the extent of surface oxidation of clean Ni to form NiF2, as calculated from Ni 2p and F 1s XPS spectra, was found to be significantly higher for gas-, compared to liquid-phase AHF. Thin (ca. 100 nm), mirror-like Ni films sputtered onto the surface of a sapphire disk yielded upon exposure to gas-phase AHF (after contact with the laboratory atmosphere) scanning electron microscope images displaying a coherent, patchy structure with raised junctures. This behavior was ascribed to internal compressive stresses induced by the formation of a nickel(II) fluoride layer on the metal surface.

UR - http://www.scopus.com/inward/record.url?scp=0034319747&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0034319747&partnerID=8YFLogxK

U2 - 10.1149/1.1394043

DO - 10.1149/1.1394043

M3 - Article

VL - 147

SP - 4212

EP - 4216

JO - Journal of the Electrochemical Society

JF - Journal of the Electrochemical Society

SN - 0013-4651

IS - 11

ER -