XPS analysis of ultrathin SiO2 film growth on Si by ozone

S. Ichimura, K. Koike, A. Kurokawa, K. Nakamura, H. Itoh

Research output: Contribution to journalConference articlepeer-review

10 Citations (Scopus)

Fingerprint Dive into the research topics of 'XPS analysis of ultrathin SiO<sub>2</sub> film growth on Si by ozone'. Together they form a unique fingerprint.

Chemical Compounds

Engineering & Materials Science

Physics & Astronomy