XPS studies of the chemical and electrochemical behavior of copper in anhydrous hydrogen fluoride

George G. Totir, Gary S. Chottiner, Christopher L. Gross, Daniel Alberto Scherson

Research output: Contribution to journalArticle

12 Citations (Scopus)

Abstract

The reactivity of copper toward liquid anhydrous hydrofluoric acid (AHF) has been examined using ex situ X-ray photoelectron spectroscopy (XPS). Exposure of either oxide-free or air-oxidized Cu surfaces to AHF yielded XPS spectra consistent with the presence of a CuF2 layer devoid of oxygen. Cyclic voltammetric experiments involving oxide-free Cu electrodes in hexafluorobutanol (HFB)+AHF displayed a prominent oxidation peak during the first few cycles. XPS analysis of Cu electrodes emersed at potentials positive to this feature provided evidence for the presence of a CuF2 layer much thicker than that found by simple immersion in AHF. Furthermore, the onset potential for both oxidation and subsequent reduction of the film was 0.0 V versus a Cu electrode in the same solution, which suggests that the Cu/CuF2 redox couple controls the potential of the reference electrode.

Original languageEnglish
Pages (from-to)151-156
Number of pages6
JournalJournal of Electroanalytical Chemistry
Volume532
Issue number1-2
DOIs
Publication statusPublished - 2002 Sep 6
Externally publishedYes

Fingerprint

Hydrofluoric Acid
Hydrofluoric acid
Copper
X ray photoelectron spectroscopy
Hydrogen
Electrodes
Oxides
Oxidation
Oxygen
Liquids
Air
Experiments

Keywords

  • Anodic film
  • Cyclic voltammetry
  • Electrocatalysis
  • Electrochemical fluorination
  • Surface reactions
  • X-ray photoelectron spectroscopy (XPS)

ASJC Scopus subject areas

  • Analytical Chemistry
  • Chemical Engineering(all)
  • Electrochemistry

Cite this

XPS studies of the chemical and electrochemical behavior of copper in anhydrous hydrogen fluoride. / Totir, George G.; Chottiner, Gary S.; Gross, Christopher L.; Scherson, Daniel Alberto.

In: Journal of Electroanalytical Chemistry, Vol. 532, No. 1-2, 06.09.2002, p. 151-156.

Research output: Contribution to journalArticle

Totir, George G. ; Chottiner, Gary S. ; Gross, Christopher L. ; Scherson, Daniel Alberto. / XPS studies of the chemical and electrochemical behavior of copper in anhydrous hydrogen fluoride. In: Journal of Electroanalytical Chemistry. 2002 ; Vol. 532, No. 1-2. pp. 151-156.
@article{bff1976b4d194098bbcc32a0c5ba375c,
title = "XPS studies of the chemical and electrochemical behavior of copper in anhydrous hydrogen fluoride",
abstract = "The reactivity of copper toward liquid anhydrous hydrofluoric acid (AHF) has been examined using ex situ X-ray photoelectron spectroscopy (XPS). Exposure of either oxide-free or air-oxidized Cu surfaces to AHF yielded XPS spectra consistent with the presence of a CuF2 layer devoid of oxygen. Cyclic voltammetric experiments involving oxide-free Cu electrodes in hexafluorobutanol (HFB)+AHF displayed a prominent oxidation peak during the first few cycles. XPS analysis of Cu electrodes emersed at potentials positive to this feature provided evidence for the presence of a CuF2 layer much thicker than that found by simple immersion in AHF. Furthermore, the onset potential for both oxidation and subsequent reduction of the film was 0.0 V versus a Cu electrode in the same solution, which suggests that the Cu/CuF2 redox couple controls the potential of the reference electrode.",
keywords = "Anodic film, Cyclic voltammetry, Electrocatalysis, Electrochemical fluorination, Surface reactions, X-ray photoelectron spectroscopy (XPS)",
author = "Totir, {George G.} and Chottiner, {Gary S.} and Gross, {Christopher L.} and Scherson, {Daniel Alberto}",
year = "2002",
month = "9",
day = "6",
doi = "10.1016/S0022-0728(02)00951-8",
language = "English",
volume = "532",
pages = "151--156",
journal = "Journal of Electroanalytical Chemistry",
issn = "0022-0728",
publisher = "Elsevier Sequoia",
number = "1-2",

}

TY - JOUR

T1 - XPS studies of the chemical and electrochemical behavior of copper in anhydrous hydrogen fluoride

AU - Totir, George G.

AU - Chottiner, Gary S.

AU - Gross, Christopher L.

AU - Scherson, Daniel Alberto

PY - 2002/9/6

Y1 - 2002/9/6

N2 - The reactivity of copper toward liquid anhydrous hydrofluoric acid (AHF) has been examined using ex situ X-ray photoelectron spectroscopy (XPS). Exposure of either oxide-free or air-oxidized Cu surfaces to AHF yielded XPS spectra consistent with the presence of a CuF2 layer devoid of oxygen. Cyclic voltammetric experiments involving oxide-free Cu electrodes in hexafluorobutanol (HFB)+AHF displayed a prominent oxidation peak during the first few cycles. XPS analysis of Cu electrodes emersed at potentials positive to this feature provided evidence for the presence of a CuF2 layer much thicker than that found by simple immersion in AHF. Furthermore, the onset potential for both oxidation and subsequent reduction of the film was 0.0 V versus a Cu electrode in the same solution, which suggests that the Cu/CuF2 redox couple controls the potential of the reference electrode.

AB - The reactivity of copper toward liquid anhydrous hydrofluoric acid (AHF) has been examined using ex situ X-ray photoelectron spectroscopy (XPS). Exposure of either oxide-free or air-oxidized Cu surfaces to AHF yielded XPS spectra consistent with the presence of a CuF2 layer devoid of oxygen. Cyclic voltammetric experiments involving oxide-free Cu electrodes in hexafluorobutanol (HFB)+AHF displayed a prominent oxidation peak during the first few cycles. XPS analysis of Cu electrodes emersed at potentials positive to this feature provided evidence for the presence of a CuF2 layer much thicker than that found by simple immersion in AHF. Furthermore, the onset potential for both oxidation and subsequent reduction of the film was 0.0 V versus a Cu electrode in the same solution, which suggests that the Cu/CuF2 redox couple controls the potential of the reference electrode.

KW - Anodic film

KW - Cyclic voltammetry

KW - Electrocatalysis

KW - Electrochemical fluorination

KW - Surface reactions

KW - X-ray photoelectron spectroscopy (XPS)

UR - http://www.scopus.com/inward/record.url?scp=0037031506&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0037031506&partnerID=8YFLogxK

U2 - 10.1016/S0022-0728(02)00951-8

DO - 10.1016/S0022-0728(02)00951-8

M3 - Article

AN - SCOPUS:0037031506

VL - 532

SP - 151

EP - 156

JO - Journal of Electroanalytical Chemistry

JF - Journal of Electroanalytical Chemistry

SN - 0022-0728

IS - 1-2

ER -