A superconducting field-effect transistor (FET) with a 0.1-μm-length gate electrode was fabricated and tested at liquid-helium temperature. Two superconducting electrodes (source and drain) were formed on the same Si substrate surface with an oxide-insulated gate electrode by a self-aligned fabrication process. Superconducting current flowing through the semiconductor (Si) between the two superconducting electrodes (Nb) was controlled by a gate-bias voltage.
|ジャーナル||Electron device letters|
|出版ステータス||Published - 1989 2|
ASJC Scopus subject areas