30 Years of electroless plating for semiconductor and polymer micro-systems

Y. Shacham-Diamand, Tetsuya Osaka, Y. Okinaka, A. Sugiyama, V. Dubin

研究成果: Article

57 引用 (Scopus)

抄録

Electroless deposition (ELD) is a well-known method for preparing thin films of metals and their alloys. It is a highly selective method allowing additive patterning of isolated and embedded structures on insulating substrates, e.g. glass, plastic or ceramic. It is a relatively low temperature (less than the boiling point of the electrolyte) and low cost process compared to other physical and chemical vapor deposition methods. ELD features uniform and normally conformal deposition (additives may affect its conformality) with low defect density and some unique material properties. In the last 30 years electroless plating of metals (e.g. copper, gold, nickel, cobalt, palladium, iron, silver, etc.) and their alloys, was demonstrated for micro system applications: microelectronics, micro electro mechanics, micro electro optics and microfluidics, micro fuel cells, micro batteries etc. Electroless plating was also demonstrated on nano structures, both artificial and natural. In this paper we present a short tribute to the recent advances in electroless plating in the last 30 years. Those advances and innovations are due to the work of many scientists and engineers on a time span started in the 19th century. The progress in electroless plating followed the need and the trend for better metallization technologies for complex structures with critical dimensions that had been shrinking continuously in the last few decades.

元の言語English
ページ(範囲)35-45
ページ数11
ジャーナルMicroelectronic Engineering
132
DOI
出版物ステータスPublished - 2015 1 25

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Electroless plating
plating
Polymers
Semiconductor materials
electroless deposition
polymers
electromechanics
Fuel cells
Metals
microelectronics
boiling
metals
engineers
electro-optics
fuel cells
electric batteries
palladium
cobalt
plastics
Defect density

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Surfaces, Coatings and Films
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics

これを引用

30 Years of electroless plating for semiconductor and polymer micro-systems. / Shacham-Diamand, Y.; Osaka, Tetsuya; Okinaka, Y.; Sugiyama, A.; Dubin, V.

:: Microelectronic Engineering, 巻 132, 25.01.2015, p. 35-45.

研究成果: Article

Shacham-Diamand, Y. ; Osaka, Tetsuya ; Okinaka, Y. ; Sugiyama, A. ; Dubin, V. / 30 Years of electroless plating for semiconductor and polymer micro-systems. :: Microelectronic Engineering. 2015 ; 巻 132. pp. 35-45.
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