A multimicroelectrode fabricated by silicon dry etching

Kohro Takahashi*, Shuichi Shoji, Tadayuki Matsuo

*この研究の対応する著者

研究成果: Article査読

抄録

In neuro‐physiology, it is important to record neural impulses from the central neural system simultaneously. For this purpose, a silicon substrate which forms a multimicroelectrode was fabricated and a precise fabrication of a 10 μm thick microelectrode with a 30 μm wide tip was achieved by using Si dry etching. The high‐quality insulation of the electrode in a physiological solution was obtained by using Ta and high‐temperature CVD Si3N4. However, Ta itself is not adequate for the recording site because it is oxidized easily in an electrolyte causing the increase of the electrode impedance. Platinum‐black was electroplated on the titanium surface in order to stabilize and reduce the electrode impedance. The interelectrode crosstalk between electrodes and signal attenuation due to the parasitic capacitances were 0.4% and 4.4%, respectively.

本文言語English
ページ(範囲)86-92
ページ数7
ジャーナルElectronics and Communications in Japan (Part II: Electronics)
70
4
DOI
出版ステータスPublished - 1987
外部発表はい

ASJC Scopus subject areas

  • 物理学および天文学(全般)
  • コンピュータ ネットワークおよび通信
  • 電子工学および電気工学

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