A new electrodeposition process of crystalline silicon utilizing water-soluble KF-KCl molten salt

Kazuma Maeda*, Kouji Yasuda, Toshiyuki Nohira, Rika Hagiwara, Takayuki Homma

*この研究の対応する著者

研究成果: Conference contribution

12 被引用数 (Scopus)

抄録

Toward the establishment of a new electrodeposition process of Si, the optimum conditions for obtaining adherent, compact and smooth Si film in molten KF-KCl-K2SiF6 were investigated. Galvanostatic electrolysis was conducted on an Ag substrate in eutectic KF-KCl (45:55 mol%) with various current densities (10- 500 mA cm-2) and K2SiF6 concentrations (0.50-5.0 mol%) at 923 K. Cross-sectional SEM observation of the deposits revealed that compact and smooth Si films form at intermediate K2SiF6 concentration and current density. The morphology of the Si deposit changed into nodular at higher current density. At lower current density, detachment of Si layer from the Ag substrate occurred during the water washing. The relationship between the deposition conditions and Si morphology is discussed from the view point of electrodeposition mechanism.

本文言語English
ホスト出版物のタイトルMolten Salts and Ionic Liquids 19
編集者Hugh C. De Long, W. Matthew Reichert, Paul C. Trulove, Luke M. Haverhals, Minoru Mizuhata, Robert A. Mantz, Adriana Ispas, Andreas Bund
出版社Electrochemical Society Inc.
ページ285-291
ページ数7
4
ISBN(電子版)9781607685395
DOI
出版ステータスPublished - 2014 1 1
イベント19th International Symposium on Molten Salts and Ionic Liquids, MS and IL 2014, part of the Joint Meeting of the 226th ECS Meeting and 29th SMEQ Meeting - Cancun, Mexico
継続期間: 2014 10 52014 10 9

出版物シリーズ

名前ECS Transactions
番号4
64
ISSN(印刷版)1938-6737
ISSN(電子版)1938-5862

Conference

Conference19th International Symposium on Molten Salts and Ionic Liquids, MS and IL 2014, part of the Joint Meeting of the 226th ECS Meeting and 29th SMEQ Meeting
国/地域Mexico
CityCancun
Period14/10/514/10/9

ASJC Scopus subject areas

  • 工学(全般)

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