A two-dimensional anisotropic wet etching simulator for quartz crystal

Meng Zhao*, Jiani Wang, Hiroshi Oigawa, Jing Ji, Hisanori Hayashi, Toshitsugu Ueda

*この研究の対応する著者

研究成果査読

2 被引用数 (Scopus)

抄録

We developed an anisotropic wet etching simulator that can predict the etching profile of initial shape, which is two-dimensional and formed by straight lines. New etching rate database of quartz at a special condition was obtained. Improved hull method was used to deal with round corner etching. New programming flow was adopted to avoid improper profile prediction. A friendly graphical user interface was built for user's convenience. The simulation result of this simulator meets well with the experimental results and shows nice accuracy in new emerging faces predicting.

本文言語English
ページ(範囲)185-188
ページ数4
ジャーナルIEEJ Transactions on Sensors and Micromachines
131
5
DOI
出版ステータスPublished - 2011

ASJC Scopus subject areas

  • 電子工学および電気工学
  • 機械工学

フィンガープリント

「A two-dimensional anisotropic wet etching simulator for quartz crystal」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル