抄録
We developed an anisotropic wet etching simulator that can predict the etching profile of initial shape, which is two-dimensional and formed by straight lines. New etching rate database of quartz at a special condition was obtained. Improved hull method was used to deal with round corner etching. New programming flow was adopted to avoid improper profile prediction. A friendly graphical user interface was built for user's convenience. The simulation result of this simulator meets well with the experimental results and shows nice accuracy in new emerging faces predicting.
本文言語 | English |
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ページ(範囲) | 185-188 |
ページ数 | 4 |
ジャーナル | IEEJ Transactions on Sensors and Micromachines |
巻 | 131 |
号 | 5 |
DOI | |
出版ステータス | Published - 2011 |
ASJC Scopus subject areas
- 電子工学および電気工学
- 機械工学