A two-stage point pattern matching algorithm using ellipse fitting and dual Hilbert Scans

研究成果: Article

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Point Pattern Matching (PPM) is an essential problem in many image analysis and computer vision tasks. This paper presents a two-stage algorithm for PPM problem using ellipse fitting and dual Hilbert scans. In the first matching stage, transformation parameters are coarsely estimated by using four node points of ellipses which are fitted by Weighted Least Square Fitting (WLSF). Then, Hilbert scans are used in two aspects of the second matching stage: it is applied to the similarity measure and it is also used for search space reduction. The similarity measure named Hilbert Scanning Distance (HSD) can be computed fast by converting the 2-D coordinates of 2-D points into 1-D space information using Hilbert scan. On the other hand, the N-D search space can be converted to a 1-D search space sequence by N-D Hilbert Scan and an efficient search strategy is proposed on the 1-D search space sequence. In the experiments, we use both simulated point set data and real fingerprint images to evaluate the performance of our algorithm, and our algorithm gives satisfying results both in accuracy and efficiency.

元の言語English
ページ(範囲)2477-2484
ページ数8
ジャーナルIEICE Transactions on Information and Systems
E91-D
発行部数10
DOI
出版物ステータスPublished - 2008 10

ASJC Scopus subject areas

  • Software
  • Hardware and Architecture
  • Computer Vision and Pattern Recognition
  • Electrical and Electronic Engineering
  • Artificial Intelligence

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