Ablation threshold and crater morphology of amorphous and crystalline SiO2 glass for extreme ultraviolet femtosecond pulses

T. Shibuya*, K. Sakaue, H. Ogawa, T. H. Dinh, D. Satoh, E. Terasawa, M. Washio, M. Tanaka, T. Higashiguchi, M. Ishino, Y. Kubota, Y. Inubushi, S. Owada, M. Nishikino, Y. Kobayashi, R. Kuroda

*この研究の対応する著者

研究成果: Article査読

抄録

The ablation threshold fluence and crater morphology of amorphous and crystalline SiO2 glass were analyzed in the regime of an extreme ultraviolet femtosecond pulse. Despite the difference between the densities (or optical penetration depths) of amorphous and crystalline SiO2 glass, the ablation threshold fluences and crater morphologies were found to be comparable. In addition, we compared our experimental results at a 10.3 nm wavelength with those in a previous work at a 13.5 nm wavelength. We conclude that the impact of the difference in density or optical penetration depth of several tens of percent on the ablation process is limited.

本文言語English
論文番号122004
ジャーナルJapanese journal of applied physics
59
12
DOI
出版ステータスPublished - 2020 12 1

ASJC Scopus subject areas

  • 工学(全般)
  • 物理学および天文学(全般)

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