Adsorption of organic molecules by photochemical reaction on Cl:Si(1 1 1) and H:Si(1 1 1) evaluated by HREELS

Katsuhiko Nishiyama*, Yosuke Tanaka, Hiroshi Harada, Taro Yamada, Daisuke Niwa, Tomoyuki Inoue, Takayuki Homma, Tetsuya Osaka, Isao Taniguchi

*この研究の対応する著者

研究成果: Article査読

11 被引用数 (Scopus)

抄録

The covalent attachment of alkyl groups to silicon surfaces, via carbon-silicon bond formation, has been attempted using gas-surface reactions starting from Cl-terminated Si(1 1 1) or H:Si(1 1 1) under ultraviolet light irradiation. The formation of Cl-terminated Si(1 1 1) and its resulting stability were examined prior to deposition of organic molecules. High-resolution electron energy loss spectroscopy (HREELS) was utilized for detecting surface-bound adsorbates. The detection of photo-deposited organic species on Cl:Si(1 1 1) from gas-phase CH4 or CH2{double bond, long}CH2 was not significant. On H:Si(1 1 1), it was evident that after the photoreaction with gas-phase C2H5Cl, C2H5 groups were chemically bonded to the surface Si atoms through single covalent bonds. The C2H5 groups were thermally stable at temperatures below 600 K. Alkyl monolayers prepared on silicon surfaces by dry process will lead to a new prospective technology of nanoscale fabrication and biochemical applications.

本文言語English
ページ(範囲)1965-1972
ページ数8
ジャーナルSurface Science
600
10
DOI
出版ステータスPublished - 2006 5 15

ASJC Scopus subject areas

  • 凝縮系物理学
  • 表面および界面
  • 表面、皮膜および薄膜
  • 材料化学

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