As electronics continue to decrease in size, new classes of materials are necessary to continue this downsizing trend. Of particular importance is the development of high-performance capacitors based on dielectric films. Ultrathin high-k dielectrics are expected to be key to future applications. Recently, we have developed new high-k nanodielectrics based on molecularly thin oxide nanosheets [Ti0.87O2, Ti2NbO7, (Ca,Sr)2Nb3O10]. Newly developed nanosheets exhibited the highest permittivity (ϵr > 100) ever realized in all known dielectrics in the ultrathin region (<10 nm). In this review, we present recent progress in dielectric nanosheets, highlighting emerging functionalities in capacitor applications.
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