AFM Tip Characterizer fabricated by Si/SiO2 multilayers

Hisataka Takenaka; Masatoshi Hatayama; Hisashi Ito; Tadayuki Ohchi; Akio Takano; Satoru Kurosawa; Hiroshi Itoh; Shingo Ichimura

doi:10.1380/ejssnt.2011.293

AFM Tip Characterizer fabricated by Si/SiO₂ multilayers

Hisataka Takenaka, Masatoshi Hatayama, Hisashi Ito, Tadayuki Ohchi, Akio Takano, Satoru Kurosawa, Hiroshi Itoh, Shingo Ichimura

研究成果: Article › 査読

2 被引用数 (Scopus)

抄録

An atomic force microscopy (AFM) tip characterizer with measurement ranges from 7.7 nm to 131 nm was developed using Si/SiO₂ multilayers. This characterizer was constructed with isolated line structures and comb- shaped trench structures. The shape of a standard Si AFM tip was estimated using this characterizer. The result shows that this Si/SiO₂ multilayer-type tip characterizer has good potential for the characterization of AFM tips with a fine radius.

本文言語	English
ページ（範囲）	293-296
ページ数	4
ジャーナル	e-Journal of Surface Science and Nanotechnology
巻	9
DOI	https://doi.org/10.1380/ejssnt.2011.293
出版ステータス	Published - 2011 7 16
外部発表	はい

ASJC Scopus subject areas

Biotechnology
Bioengineering
Condensed Matter Physics
Mechanics of Materials
Surfaces and Interfaces
Surfaces, Coatings and Films

文献へのアクセス

10.1380/ejssnt.2011.293

他のファイルとリンク

フィンガープリント「AFM Tip Characterizer fabricated by Si/SiO<sub>2</sub> multilayers」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル

@article{0a53719e4c31475f86b6d3bfe07ca9cd,

title = "AFM Tip Characterizer fabricated by Si/SiO2 multilayers",

abstract = "An atomic force microscopy (AFM) tip characterizer with measurement ranges from 7.7 nm to 131 nm was developed using Si/SiO2 multilayers. This characterizer was constructed with isolated line structures and comb- shaped trench structures. The shape of a standard Si AFM tip was estimated using this characterizer. The result shows that this Si/SiO2 multilayer-type tip characterizer has good potential for the characterization of AFM tips with a fine radius.",

keywords = "Atomic force microscopy, Multilayer, Tip characterizer",

author = "Hisataka Takenaka and Masatoshi Hatayama and Hisashi Ito and Tadayuki Ohchi and Akio Takano and Satoru Kurosawa and Hiroshi Itoh and Shingo Ichimura",

year = "2011",

month = jul,

day = "16",

doi = "10.1380/ejssnt.2011.293",

language = "English",

volume = "9",

pages = "293--296",

journal = "e-Journal of Surface Science and Nanotechnology",

issn = "1348-0391",

publisher = "Surface Science Society of Japan",

}

TY - JOUR

T1 - AFM Tip Characterizer fabricated by Si/SiO2 multilayers

AU - Takenaka, Hisataka

AU - Hatayama, Masatoshi

AU - Ito, Hisashi

AU - Ohchi, Tadayuki

AU - Takano, Akio

AU - Kurosawa, Satoru

AU - Itoh, Hiroshi

AU - Ichimura, Shingo

PY - 2011/7/16

Y1 - 2011/7/16

N2 - An atomic force microscopy (AFM) tip characterizer with measurement ranges from 7.7 nm to 131 nm was developed using Si/SiO2 multilayers. This characterizer was constructed with isolated line structures and comb- shaped trench structures. The shape of a standard Si AFM tip was estimated using this characterizer. The result shows that this Si/SiO2 multilayer-type tip characterizer has good potential for the characterization of AFM tips with a fine radius.

AB - An atomic force microscopy (AFM) tip characterizer with measurement ranges from 7.7 nm to 131 nm was developed using Si/SiO2 multilayers. This characterizer was constructed with isolated line structures and comb- shaped trench structures. The shape of a standard Si AFM tip was estimated using this characterizer. The result shows that this Si/SiO2 multilayer-type tip characterizer has good potential for the characterization of AFM tips with a fine radius.

KW - Atomic force microscopy

KW - Multilayer

KW - Tip characterizer

UR - http://www.scopus.com/inward/record.url?scp=79960536509&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=79960536509&partnerID=8YFLogxK

U2 - 10.1380/ejssnt.2011.293

DO - 10.1380/ejssnt.2011.293

M3 - Article

AN - SCOPUS:79960536509

VL - 9

SP - 293

EP - 296

JO - e-Journal of Surface Science and Nanotechnology

JF - e-Journal of Surface Science and Nanotechnology

SN - 1348-0391

ER -