AFM Tip Characterizer fabricated by Si/SiO2 multilayers

Hisataka Takenaka; Masatoshi Hatayama; Hisashi Ito; Tadayuki Ohchi; Akio Takano; Satoru Kurosawa; Hiroshi Itoh; Shingo Ichimura

doi:10.1380/ejssnt.2011.293

AFM Tip Characterizer fabricated by Si/SiO₂ multilayers

Hisataka Takenaka^*, Masatoshi Hatayama, Hisashi Ito, Tadayuki Ohchi, Akio Takano, Satoru Kurosawa, Hiroshi Itoh, Shingo Ichimura

^*この研究の対応する著者

研究成果: Article › 査読

3 被引用数 (Scopus)

抄録

An atomic force microscopy (AFM) tip characterizer with measurement ranges from 7.7 nm to 131 nm was developed using Si/SiO₂ multilayers. This characterizer was constructed with isolated line structures and comb- shaped trench structures. The shape of a standard Si AFM tip was estimated using this characterizer. The result shows that this Si/SiO₂ multilayer-type tip characterizer has good potential for the characterization of AFM tips with a fine radius.

本文言語	English
ページ（範囲）	293-296
ページ数	4
ジャーナル	e-Journal of Surface Science and Nanotechnology
巻	9
DOI	https://doi.org/10.1380/ejssnt.2011.293
出版ステータス	Published - 2011 7月 16
外部発表	はい

ASJC Scopus subject areas

バイオテクノロジー
バイオエンジニアリング
凝縮系物理学
材料力学
表面および界面
表面、皮膜および薄膜

文献へのアクセス

10.1380/ejssnt.2011.293

他のファイルとリンク

引用スタイル

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AU - Kurosawa, Satoru

AU - Itoh, Hiroshi

AU - Ichimura, Shingo

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