AFM Tip Characterizer fabricated by Si/SiO2 multilayers

Hisataka Takenaka, Masatoshi Hatayama, Hisashi Ito, Tadayuki Ohchi, Akio Takano, Satoru Kurosawa, Hiroshi Itoh, Shingo Ichimura

研究成果: Article査読

2 被引用数 (Scopus)

抄録

An atomic force microscopy (AFM) tip characterizer with measurement ranges from 7.7 nm to 131 nm was developed using Si/SiO2 multilayers. This characterizer was constructed with isolated line structures and comb- shaped trench structures. The shape of a standard Si AFM tip was estimated using this characterizer. The result shows that this Si/SiO2 multilayer-type tip characterizer has good potential for the characterization of AFM tips with a fine radius.

本文言語English
ページ(範囲)293-296
ページ数4
ジャーナルe-Journal of Surface Science and Nanotechnology
9
DOI
出版ステータスPublished - 2011 7 16
外部発表はい

ASJC Scopus subject areas

  • Biotechnology
  • Bioengineering
  • Condensed Matter Physics
  • Mechanics of Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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