An impact of process variation on supply voltage dependence of logic path delay variation

Shinichi Nishizawa; Tohru Ishihara; Hidetoshi Onodera

doi:10.1109/VLSI-DAT.2015.7114534

An impact of process variation on supply voltage dependence of logic path delay variation

Shinichi Nishizawa, Tohru Ishihara, Hidetoshi Onodera

研究成果: Conference contribution

1 被引用数 (Scopus)

抄録

Dynamic Voltage and Frequency Scaling (DVFS) technique requires accurate observation of critical path delay for robust operation under aggressive supply voltage scaling. Logic paths contain several types of logic gates and path delay have voltage dependences because different logic gates have different voltage dependences. However, it is not well investigated that how the voltage dependence of the path delay changes induced by process variation. This paper describes the effect of the process variation on the voltage dependence of path delay. Ring Oscillator circuits fabricated in 65-nm CMOS process are used for the evaluation and analysis of the process variation dependence of the voltage delay curves.

本文言語	English
ホスト出版物のタイトル	2015 International Symposium on VLSI Design, Automation and Test, VLSI-DAT 2015
出版社	Institute of Electrical and Electronics Engineers Inc.
ISBN（電子版）	9781479962754
DOI	https://doi.org/10.1109/VLSI-DAT.2015.7114534
出版ステータス	Published - 2015 5月 28
外部発表	はい
イベント	2015 International Symposium on VLSI Design, Automation and Test, VLSI-DAT 2015 - Hsinchu, Taiwan, Province of China 継続期間: 2015 4月 27 → 2015 4月 29

出版物シリーズ

名前	2015 International Symposium on VLSI Design, Automation and Test, VLSI-DAT 2015

Conference

Conference	2015 International Symposium on VLSI Design, Automation and Test, VLSI-DAT 2015
国/地域	Taiwan, Province of China
City	Hsinchu
Period	15/4/27 → 15/4/29

ASJC Scopus subject areas

ハードウェアとアーキテクチャ
電子工学および電気工学

文献へのアクセス

10.1109/VLSI-DAT.2015.7114534

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引用スタイル

Nishizawa, S., Ishihara, T., & Onodera, H. (2015). An impact of process variation on supply voltage dependence of logic path delay variation. In 2015 International Symposium on VLSI Design, Automation and Test, VLSI-DAT 2015 [7114534] (2015 International Symposium on VLSI Design, Automation and Test, VLSI-DAT 2015). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/VLSI-DAT.2015.7114534

An impact of process variation on supply voltage dependence of logic path delay variation. / Nishizawa, Shinichi; Ishihara, Tohru; Onodera, Hidetoshi.

2015 International Symposium on VLSI Design, Automation and Test, VLSI-DAT 2015. Institute of Electrical and Electronics Engineers Inc., 2015. 7114534 (2015 International Symposium on VLSI Design, Automation and Test, VLSI-DAT 2015).

研究成果: Conference contribution

Nishizawa, S, Ishihara, T & Onodera, H 2015, An impact of process variation on supply voltage dependence of logic path delay variation. in 2015 International Symposium on VLSI Design, Automation and Test, VLSI-DAT 2015., 7114534, 2015 International Symposium on VLSI Design, Automation and Test, VLSI-DAT 2015, Institute of Electrical and Electronics Engineers Inc., 2015 International Symposium on VLSI Design, Automation and Test, VLSI-DAT 2015, Hsinchu, Taiwan, Province of China, 15/4/27. https://doi.org/10.1109/VLSI-DAT.2015.7114534

Nishizawa S, Ishihara T, Onodera H. An impact of process variation on supply voltage dependence of logic path delay variation. In 2015 International Symposium on VLSI Design, Automation and Test, VLSI-DAT 2015. Institute of Electrical and Electronics Engineers Inc. 2015. 7114534. (2015 International Symposium on VLSI Design, Automation and Test, VLSI-DAT 2015). doi: 10.1109/VLSI-DAT.2015.7114534

Nishizawa, Shinichi ; Ishihara, Tohru ; Onodera, Hidetoshi. / An impact of process variation on supply voltage dependence of logic path delay variation. 2015 International Symposium on VLSI Design, Automation and Test, VLSI-DAT 2015. Institute of Electrical and Electronics Engineers Inc., 2015. (2015 International Symposium on VLSI Design, Automation and Test, VLSI-DAT 2015).

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AB - Dynamic Voltage and Frequency Scaling (DVFS) technique requires accurate observation of critical path delay for robust operation under aggressive supply voltage scaling. Logic paths contain several types of logic gates and path delay have voltage dependences because different logic gates have different voltage dependences. However, it is not well investigated that how the voltage dependence of the path delay changes induced by process variation. This paper describes the effect of the process variation on the voltage dependence of path delay. Ring Oscillator circuits fabricated in 65-nm CMOS process are used for the evaluation and analysis of the process variation dependence of the voltage delay curves.

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An impact of process variation on supply voltage dependence of logic path delay variation

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出版物シリーズ

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ASJC Scopus subject areas

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