抜粋
The electroless-deposition process of NiP film was studied using in situ scanning tunneling microscopy (STM). By potentiostatic control of the substrate electrode during the STM scan, the initial deposition process of NiP was observed, revealing features that differ from those of the electrodeposition process, which was also observed in situ. The growth process over the same area during the progress of deposition was also observed sequentially. The results obtained suggest that the electroless-deposition process of NiP is a result of continuous nucleation of grains and their three-dimensional growth.
| 元の言語 | English |
|---|---|
| ページ（範囲） | 732-736 |
| ページ数 | 5 |
| ジャーナル | Journal of the Electrochemical Society |
| 巻 | 139 |
| 発行部数 | 3 |
| DOI | |
| 出版物ステータス | Published - 1992 3 |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Renewable Energy, Sustainability and the Environment
- Surfaces, Coatings and Films
- Electrochemistry
- Materials Chemistry
フィンガープリント An in Situ Study on Electroless-Deposition Process by Scanning Tunneling Microscopy' の研究トピックを掘り下げます。これらはともに一意のフィンガープリントを構成します。
これを引用
Homma, T., Yamazaki, T., & Osaka, T. (1992). An in Situ Study on Electroless-Deposition Process by Scanning Tunneling Microscopy. Journal of the Electrochemical Society, 139(3), 732-736. https://doi.org/10.1149/1.2069293