An in Situ Study on Electroless-Deposition Process by Scanning Tunneling Microscopy

Takayuki Homma, Takuya Yamazaki, Tetsuya Osaka

研究成果: Article査読

23 被引用数 (Scopus)

抄録

The electroless-deposition process of NiP film was studied using in situ scanning tunneling microscopy (STM). By potentiostatic control of the substrate electrode during the STM scan, the initial deposition process of NiP was observed, revealing features that differ from those of the electrodeposition process, which was also observed in situ. The growth process over the same area during the progress of deposition was also observed sequentially. The results obtained suggest that the electroless-deposition process of NiP is a result of continuous nucleation of grains and their three-dimensional growth.

本文言語English
ページ(範囲)732-736
ページ数5
ジャーナルJournal of the Electrochemical Society
139
3
DOI
出版ステータスPublished - 1992 3

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Renewable Energy, Sustainability and the Environment
  • Surfaces, Coatings and Films
  • Electrochemistry
  • Materials Chemistry

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